Study of new deposition method for the DLC thin film by using a pseudo-spark discharge CVD

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In this research, a new thin film deposition system is developed that a diamond-like carbon film is generated by using a pseudo-spark discharge plasma jet. This discharge is a large current discharge at low pressure region. It was found that plasma of high density (the order of 10^<20>m^<-3>) was spouted out within a radius of 50 mm of the center axis for the electrodes. The ion density of spouted plasma jet depends on the diameter of anode hole, distance between the electrodes, the discharge current and the rate of gas flow. But effect of the electromagnetic force can't confirm by discharge current as large as it isn't almost influenced by the discharge current in this experimental conditions. As a result of deposition experiment, it is succeeded that the thin film deposit on the silicon substrate.