Study of new deposition method for the DLC thin film by using a pseudo-spark discharge CVD

伪火花放电CVD沉积DLC薄膜新方法的研究

• 批准号: 21760238
• 负责人: KAMADA Takaharu
• 金额: $ 3万
• 依托单位: Hachinohe National College of Technology
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Young Scientists (B)
• 财政年份: 2009
• 资助国家: 日本
• 起止时间: 2009 至 2010
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-21760238/
• 关键词: 擬火花放電; プラズマジェット; イオン密度; ダブルプローブ; DLC薄膜; 擬火花放電プラズマジェット; 高密度プラズマ; プラズマ計測

In this research, a new thin film deposition system is developed that a diamond-like carbon film is generated by using a pseudo-spark discharge plasma jet. This discharge is a large current discharge at low pressure region. It was found that plasma of high density (the order of 10^<20>m^<-3>) was spouted out within a radius of 50 mm of the center axis for the electrodes. The ion density of spouted plasma jet depends on the diameter of anode hole, distance between the electrodes, the discharge current and the rate of gas flow. But effect of the electromagnetic force can't confirm by discharge current as large as it isn't almost influenced by the discharge current in this experimental conditions. As a result of deposition experiment, it is succeeded that the thin film deposit on the silicon substrate.

在这项研究中，开发了一种新的薄膜沉积系统，通过使用赝火花放电等离子体射流生成类金刚石碳膜。该放电是低压区域的大电流放电。发现在电极中心轴50mm半径范围内喷出高密度(10^20m^-3数量级)的等离子体。喷射等离子体射流的离子密度取决于阳极孔的直径、电极之间的距离、放电电流和气体流速。但电磁力的作用不能用那么大的放电电流来证实，因为在本实验条件下它几乎不受放电电流的影响。沉积实验的结果是，成功地在硅衬底上沉积了薄膜。

项目成果

擬火花放電プラズマジェットの基礎特性とDLC膜作製

赝火花放电等离子体射流基本特性及DLC薄膜制备

• 发表时间: 2010
• 作者: 鎌田貴晴;渡部政行;藤原民也
• 通讯作者: 藤原民也

An Effect for Diameter of Anode Hole on a Pseudo-spark Discharge Plasma Jet and the Deposition of DLC Film

阳极孔直径对赝火花放电等离子体射流及DLC薄膜沉积的影响

• 发表时间: 2009
• 作者: T.Kamada;M.Watanabe;T.Fujiwara
• 通讯作者: T.Fujiwara