The method based on QCD-model for planning and controlling a multi-chamber tool and a production network

基于QCD模型的多室工具和生产网络规划和控制方法

• 批准号: 21760303
• 负责人: ARIMA Sumika
• 金额: $ 4.3万
• 依托单位: University of Tsukuba
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Young Scientists (B)
• 财政年份: 2009
• 资助国家: 日本
• 起止时间: 2009 至 2011
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-21760303/
• 关键词: システム工学; 数理工学; 統合的生産システム; QCD; 生産スケジューリング; マルチチャンバ装置; 品質推定; 予測; 生産性

in this research, I studied the method of planning and controlling production tools or a factory line for maximizing the throughput of quality products for nano-scale production in semiconductor manufacturing system. The optimal method of the manufacturing control inside a multi-chamber tool was proposed by applying queuing model with blocking and TOC (Theory of constraints), and it was applied to management at a real factory. Moreover, I created a management method which achieves simultaneously zero-rework, improvement in the throughput of quality products, the improvement in a tool utilization in product-mix production. As the result to apply the method to an actual semiconductor factory, overall equipment effectiveness(OEE) can be improved to 1.4 or more times.

在本研究中，我研究了计划和控制生产工具或工厂生产线的方法，以最大限度地提高半导体制造系统中纳米级生产的优质产品的吞吐量。将阻塞排队模型与约束理论（TOC）相结合，提出了多腔工具内制造控制的优化方法，并将其应用于实际工厂的生产管理。此外，我创造了一种管理方法，可以同时实现零返工，提高优质产品的吞吐量，提高产品组合生产中的工具利用率。将该方法应用于实际半导体工厂，整体设备效率（OEE）可提高到1.4倍以上。

项目成果

Virtual Metrology-based Engineering Chain Management by Multi-classification of Quality using Support Vector Machine for Semiconductor Manufacturing

基于虚拟计量的半导体制造中使用支持向量机进行质量多分类的工程链管理

• DOI: 10.1504/ijise.2011.040763
• 发表时间: 2011
• 期刊: International Journal of Industrial and Systems Engineering No.8 Vol.1, Inderscience publisher
• 作者: Tomoyoshi Shimobaba;Taro Toyota;Nobuyuki Masuda;Tomoyoshi Ito;Sumika ARIMA
• 通讯作者: Sumika ARIMA

DEVELOPMENT OF SEQUENTIAL ASSOCIATION RULES FOR PREVENTING MINOR-STOPPAGES IN SEMI-CONDUCTOR MANUFACTURING

制定顺序关联规则以防止半导体制造中的小停顿

• 发表时间: 2012
• 期刊: Proceedings of International conference on Operations Research and Enterprise Systems
• 作者: S. ARIMA;U. Sumita;J. Yoshii
• 通讯作者: J. Yoshii

Organized DFM Proceedings of Symposium on Photomask and NGL Mask Technology XVI (PMJ2009)

主办光掩模与NGL掩模技术研讨会DFM论文集XVI（PMJ2009）

• 发表时间: 2009
• 期刊: The International Society for Optical Engineering
• 作者: T. Sato;M. Honma;H. Itoh;N. Iriki;S. Kobayashi;S. Kuwabara;N. Miyazaki;H. Suzuki;N. Yoshioka;S. Arima;K. Kadota
• 通讯作者: K. Kadota

最適指標生成装置

最优指标生成装置

• 发表时间: 2011

Organized DFM for Total Optimization in Semiconductor Manufacturing

组织 DFM 以实现半导体制造的全面优化

• 发表时间: 2009
• 期刊: Proceedings of AEC/APC symposium Asia 2009
• 作者: T. Sato;M. Honma;H. Itoh;N. Iriki;S. Kobayashi;S. Kuwabara;N. Miyazaki;H. Suzuki;N. Yoshioka;S. Arima;K. Kadota
• 通讯作者: K. Kadota