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The method based on QCD-model for planning and controlling a multi-chamber tool and a production network

The method based on QCD-model for planning and controlling a multi-chamber tool and a production network
基于QCD模型的多室工具和生产网络规划和控制方法
批准号:
21760303
负责人:
ARIMA Sumika
金额:
$4.3万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Young Scientists (B)
财政年份:
2009
资助国家:
日本
项目状态:
已结题
起止时间:
2009 至 2011

项目摘要

项目成果

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相关文献

中文摘要
翻译
在本研究中,我研究了在半导体制造系统中,为了最大化纳米级生产的高质量产品的生产能力,计划和控制生产工具或生产线的方法。应用带阻塞排队模型和约束理论,提出了多腔刀具制造控制的优化方法,并将其应用于实际工厂的管理中。并提出了一种同时实现零返工、提高产品良品率、提高产品组合生产中工具利用率的管理方法。将该方法应用于实际的半导体工厂,可使整体设备效能提高1.4倍以上。
英文摘要
in this research, I studied the method of planning and controlling production tools or a factory line for maximizing the throughput of quality products for nano-scale production in semiconductor manufacturing system. The optimal method of the manufacturing control inside a multi-chamber tool was proposed by applying queuing model with blocking and TOC (Theory of constraints), and it was applied to management at a real factory. Moreover, I created a management method which achieves simultaneously zero-rework, improvement in the throughput of quality products, the improvement in a tool utilization in product-mix production. As the result to apply the method to an actual semiconductor factory, overall equipment effectiveness(OEE) can be improved to 1.4 or more times.
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
Virtual Metrology-based Engineering Chain Management by Multi-classification of Quality using Support Vector Machine for Semiconductor Manufacturing
基于虚拟计量的半导体制造中使用支持向量机进行质量多分类的工程链管理
DOI: 10.1504/ijise.2011.040763
发表时间: 2011
期刊: International Journal of Industrial and Systems Engineering No.8 Vol.1, Inderscience publisher
影响因子: --
作者: [Tomoyoshi Shimobaba, Taro Toyota, Nobuyuki Masuda, Tomoyoshi Ito, Sumika ARIMA]
通讯作者: Sumika ARIMA
DOI: --
发表时间: 2012
期刊: Proceedings of International conference on Operations Research and Enterprise Systems
影响因子: --
作者: [S. ARIMA, U. Sumita, J. Yoshii]
通讯作者: J. Yoshii
Organized DFM Proceedings of Symposium on Photomask and NGL Mask Technology XVI (PMJ2009)
主办光掩模与NGL掩模技术研讨会DFM论文集XVI(PMJ2009)
DOI: --
发表时间: 2009
期刊: The International Society for Optical Engineering
影响因子: --
作者: [T. Sato, M. Honma, H. Itoh, N. Iriki, S. Kobayashi, S. Kuwabara, N. Miyazaki, H. Suzuki, N. Yoshioka, S. Arima, K. Kadota]
通讯作者: K. Kadota
最適指標生成装置
最优指标生成装置
DOI: --
发表时间: 2011
期刊:
影响因子: --
作者: []
通讯作者:
6
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