Nano-capacitor fabrication process development by using supercritical fluid

研究了超临界CO2 （scCO2）纳米电容器用于dram和feram的工艺。将有机金属化合物溶解到scCO2中，并在加热的衬底上反应形成薄膜。超临界流体沉积（SCFD）工艺用于沉积Ru、Pt和SrRuO3作为电极。此外，还制备了高介电常数材料和铁电材料TiO2、SrTiO3和BiTiO3。所开发的工艺具有良好的台阶覆盖度，与CVD/ALD的常规工艺相同，且沉积温度较低。

Process for nano-capacitors to be used in DRAMs and FeRAMs using supercritical CO2 (scCO2) was developed. Organic metal compounds were dissolved into scCO2 and reacted to form thin films on a heated substrate. This process, Supercritical Fluid Deposition, SCFD, was used to deposit Ru, Pt, and SrRuO3 as an electrode. TiO2, SrTiO3, and BiTiO3 were also deposited as a high-dielectric constant material and ferroelectric material. The developed processes showed excellent step coverage like as the conventional processes of CVD/ALD with lower deposition temperature.