Modeling of low-pressure high-density magnetic neutral loop discharge processing plasmas and analysis of their dynamic control

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Computer simulations of magnetic neutral loop discharge plasmasused for surface processing in fabrication of semiconductor integrated circuits have beenperformed. It was revealed that high-energy electrons were transported along theseparatrix of the magnetic field and generated reactive species there by dissociationof the medium gas. The flux of the reactive species on the semiconductor substrate washigh at the foot of separatrix. This result explained early experimental data well. Acontrol scheme for uniform wide-area processing by moving the foot of separatrix overthe substrate was proposed.