Elucidation of Mechanism of Film Hardening of Amorphous CarbonsBased on the High-Resolution Laser Spectroscopy
Elucidation of Mechanism of Film Hardening of Amorphous CarbonsBased on the High-Resolution Laser Spectroscopy
批准号:
22560020
负责人:
ITO Haruhiko
金额:
$3.08万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2010
资助国家:
日本
项目状态:
已结题
起止时间:
2010 至 2012
中文摘要
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英文摘要
The following results are obtained in this project.(1) The precursors of the nitrogen atoms in amorphous carbon nitride films are identified, and films possessing high-nitrogen contents are successfully fabricated.(2) The mechanism of the decomposition of the starting molecules are elucidated for the ECR plasma and microwave-discharge flow of rare gases.(3) Mechanism of the film hardening of amorphous carbon and related materials are elucidated upon the application of radio-frequency bias voltage to the substrates.
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Source of nitrogen atoms of amorphous carbon nitride films fabricated with microwave-plasma CVD processes:
采用微波等离子体CVD工艺制备的非晶氮化碳薄膜的氮原子来源:
DOI:
10.14723/tmrsj.38.31
发表时间:
2013
期刊:
Transactions-Materials Research Society of Japan
影响因子:
--
作者:
[Haruhiko Ito, A. Yamamoto, Tsuneo Suzuki, H. Saitoh]
通讯作者:
H. Saitoh
Local structural analysis of a-SiCx:H films formed by decomposition of tetramethylsilane in microwave discharge flow of Ar
Ar微波放电流中四甲基硅烷分解形成的a-SiCx:H薄膜的局部结构分析
DOI:
10.1016/j.diamond.2011.01.020
发表时间:
2011
期刊:
Diamond and Related Materials
影响因子:
4.1
作者:
[A. Wada, T. Ogaki, M. Niibe, M. Tagawa, H. Saitoh, K. Kanda, H. Ito]
通讯作者:
H. Ito
Arのマイクロ波放電フロー中でのヘキサメチルジシランの分解を用いた a-SiC_x:H膜の形成」高周波プラズマCVDによる高窒素含有a-CN_x:H 薄膜の形成
“利用Ar微波放电流中六甲基乙硅烷的分解来形成a-SiC_x:H膜” “通过高频等离子体CVD形成高氮含量a-CN_x:H薄膜”
DOI:
--
发表时间:
2013
期刊:
影响因子:
--
作者:
[熊倉基起, 斎藤秀 俊、伊藤治彦]
通讯作者:
斎藤秀 俊、伊藤治彦
BrCNの放電分解によるa-CNx薄膜の形成
BrCN放电分解形成a-CNx薄膜
DOI:
--
发表时间:
2011
期刊:
影响因子:
--
作者:
[岡田亘太郎, 津田哲平,赤坂大樹,斎藤 秀俊,伊藤治彦]
通讯作者:
津田哲平,赤坂大樹,斎藤 秀俊,伊藤治彦
Arの放電フローによるBrCNおよびCH_3CNの分解:a-CN_x(:H)膜の前駆体
Ar放电流分解BrCN和CH_3CN:a-CN_x(:H)薄膜的前驱体
DOI:
--
发表时间:
2011
期刊:
影响因子:
--
作者:
[山元愛弓, 新木一志, 和田晃, 伊藤治彦]
通讯作者:
伊藤治彦
共 51 条
Dynamics of formation of ultra-hard thin films of amorphous carbon nitride by energy-controlled ion bombardment
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批准号:19560699
-
项目类别:Grant-in-Aid for Scientific Research (C)
-
资助金额:$3.0万
-
财政年份:2007
-
负责人:ITO Haruhiko
-
依托单位:
Control of hydrogen content in the carbon nitride materials and its development to the field emission devices based on the high-resolution laser spectroscopy
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批准号:14550721
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.62万
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财政年份:2002
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负责人:ITO Haruhiko
-
依托单位:
Establishment of coating technology of superhard carbon nitrides films based on the measurement of the surface reaction probabilities.
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批准号:13555197
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$7.1万
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财政年份:2001
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负责人:ITO Haruhiko
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依托单位:
Establishment of the principle of the synthesis of the super-hard carbon nitride films based on the diagnosis by the threshold ionization mass spectrometry
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批准号:11650760
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.37万
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财政年份:1999
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负责人:ITO Haruhiko
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依托单位:
海外基金