Nanoprocessing of surface photonic elements with high intensity scattered near-field excited by femtosecond laser

纳米结构的增强近场散射被定位在纳米尺度区域，然后用于各种先进功能材料的纳米烧蚀加工。本文从飞秒激光偏振、辐照角、散射结构、散射材料、工作材料等方面介绍了近场和纳米烧蚀的理论和实验特点。等离子体散射和米氏散射的近场得到了清晰的解释。在增强近场处理的基础上，利用三维时域有限差分法很好地解释了入射飞秒激光与散射远场光干涉形成表面波纹的机理。这些方法制备的纳米图案表面有可能用于表面光子器件。

An enhanced near-field scattered from nanostructures is localized to the nano-scale zone, and is then used for nano-ablation processing of a variety of advanced functional materials. This report presents theoretically and experimentally the characteristics of near-field and nano-ablation in terms of femtosecond laser polarization, irradiation angles, scattering structures, scattering materials, work materials. Near-fields from plasmonic scattering and Mie scattering are clearly explained. In addition to the enhanced near-field processing, the mechanism of surface ripples formed by the interference of the incident femtosecond laser and the scattered far-field light is well explained by using the 3D FDTD method. The nano-patterned surfaces fabricated these methods can potentially be used for surface photonic devices.