Fabrication of transparence micro-mold using thermal oxidation for nano-imprint

点击翻译按钮获取中文摘要

Recently, X-ray phase imaging with X-ray gratings has been studied. I propose the new low cost fabrication process using Si mold using ICP-RIE and nano-imprint techniques. After thermal oxidation, Si micro-mold patterns were obtained until the bottom of high aspect ratio silicon dioxide microstructures. And, I tried the resin forming using fabricated Si mold. In these results, I obtained good grating patterns with submicron width. These demonstrations of thermal oxidation are promising method for high precision transparence imprint mold.