Study on Application of Cubic Boron Nitride Films
Study on Application of Cubic Boron Nitride Films
批准号:
09650169
负责人:
WATANABE Shuichi
金额:
$1.09万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1997
资助国家:
日本
项目状态:
已结题
起止时间:
1997 至 1998
中文摘要
由于立方氮化硼(c-BN)具有化学惰性和热惰性,其硬度仅次于金刚石,因此许多研究人员认为,c-BN薄膜为易损件、刀具刀片、旋转工具和模具提供了巨大的机会。本文研究了磁增强等离子体离子镀法制备的c-BN薄膜在机械方面的应用,特别是摩擦学方面的应用。所得结果总结如下:(1)离子注入后处理提高了c-BN膜的附着力。改进后的c-BN膜的附着力比沉积后的c-BN膜提高了约4倍。(2)实验制备了c- bn涂层刀具。实验证明,c-BN薄膜的高硬度和低摩擦性能是其切削力小的主要原因。(3)成功地形成了多层c-BN/TiN,延长了c-BN膜的摩擦学耐久寿命。多层膜的总厚度约为2.0微米。(4)为了进一步明确c-BN膜的摩擦学性能,研究了c-BN膜在不同环境下的摩擦学性能。在真空、高湿和水环境下获得了低摩擦特性。(5) c-BN膜对钛合金的摩擦性能较低。(6)将c-BN薄膜成功地涂覆在原子力显微镜所用芯片的极细衬底上。
英文摘要
Because cubic boron nitride (c-BN), which is chemically and thermally inert, is second only to diamond in hardness, many researchers believe that c-BN film offers great opportunities for wear parts, cutting tool inserts, rotary tools and dies. This study deals with some applications of c-BN films, which were synthesized by magnetically enhanced plasma ion plating, for mechanical usage, especially tribological application. The obtained results are summarized as follows :(1) The adhesion of c-BN film was improved by means of ion-implantation post-treatment. The adhesion value of improved c-BN film was about 4 times higher than that of as-deposited c-BN film.(2) The c-BN-coated cutting tool was fabricated experimentally. It was proved that high hardness and low-friction properties of the c-BN film contributed the cutting performances, such as low cutting forces.(3) Multi-layer of c-BN/TiN was successfully formed in order to elongate a tribological endurance life of c-BN film. Total thickness of the multi-layer was about 2.0 micro-meter.(4) To clarify the tribological property of c-BN film further, the properties were investigated in various environments. Low frictional characteristics were obtained in vacuum, high-humid and water environments.(5) Low frictional property of c-BN film was proved even against Ti-alloy.(6) The c-BN film was successfully coated on a very fine substrate which was a chip using for atomic force microscope.
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渡部修一他: "イオン注入した立方晶室化ホウ素膜の膜構造" 日本化学会第73回秋季年会講演予稿集. 125 (1997)
Shuichi Watanabe 等:“离子注入立方硼薄膜的膜结构”日本化学会第 73 届秋季年会论文集 125(1997)。
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Shuichi Watanabe, Shojiro Miyake and Masao Murakawa: "Tribological Performance of Cubic BN Films" Diamond Films and Technology. Vol.7, No.2. 139-156 (1997)
Shuichi Watanabe、Shojiro Miyake 和 Masao Murakawa:“立方氮化硼薄膜的摩擦学性能”金刚石薄膜和技术。
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三宅正次郎、渡部修一他: "立方晶室化ホウ素膜の水による境界潤滑特性" トライボロジー会議平成10年春 東京. (発表予定).
Shojiro Miyake、Shuichi Watanabe 等人:“由于水而导致的立方硼膜的边界润滑特性”,摩擦学会议,1998 年春季,东京(预定演讲)。
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三宅正二郎,渡部修一他: "c-BNコーテッドチップの形成とそのナノ加工特性" 表面技術協会第99回講演大会要旨集. 191-192 (1999)
Shojiro Miyake、Shuichi Watanabe 等人:“c-BN 涂层芯片的形成及其纳米加工性能”第 99 届表面技术协会会议摘要 191-192 (1999)。
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渡部修一 他: "cBN/TiN層の積層による硬質膜の形成" 第12回ダイヤモンドシンポジウム講演要旨集. 126-127 (1998)
Shuichi Watanabe 等人:“通过堆叠 cBN/TiN 层形成硬膜”第 12 届钻石研讨会摘要 126-127(1998 年)。
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