Study on Application of Cubic Boron Nitride Films
立方氮化硼薄膜的应用研究
基本信息
- 批准号:09650169
- 负责人:
- 金额:$ 1.09万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for Scientific Research (C)
- 财政年份:1997
- 资助国家:日本
- 起止时间:1997 至 1998
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
Because cubic boron nitride (c-BN), which is chemically and thermally inert, is second only to diamond in hardness, many researchers believe that c-BN film offers great opportunities for wear parts, cutting tool inserts, rotary tools and dies. This study deals with some applications of c-BN films, which were synthesized by magnetically enhanced plasma ion plating, for mechanical usage, especially tribological application. The obtained results are summarized as follows :(1) The adhesion of c-BN film was improved by means of ion-implantation post-treatment. The adhesion value of improved c-BN film was about 4 times higher than that of as-deposited c-BN film.(2) The c-BN-coated cutting tool was fabricated experimentally. It was proved that high hardness and low-friction properties of the c-BN film contributed the cutting performances, such as low cutting forces.(3) Multi-layer of c-BN/TiN was successfully formed in order to elongate a tribological endurance life of c-BN film. Total thickness of the multi-layer was about 2.0 micro-meter.(4) To clarify the tribological property of c-BN film further, the properties were investigated in various environments. Low frictional characteristics were obtained in vacuum, high-humid and water environments.(5) Low frictional property of c-BN film was proved even against Ti-alloy.(6) The c-BN film was successfully coated on a very fine substrate which was a chip using for atomic force microscope.
由于立方氮化硼(c-BN)具有化学和热惰性,硬度仅次于金刚石,许多研究人员认为c-BN薄膜为耐磨零件,切削刀具刀片,旋转刀具和模具提供了很大的机会。本研究主要探讨磁增强等离子体离子镀技术制备的立方氮化硼薄膜在机械,特别是摩擦学方面的应用。主要研究结果如下:(1)离子注入后处理提高了c-BN薄膜的附着力。改进后的c-BN膜的附着力比沉积态的c-BN膜提高了约4倍。(2)实验制备了c-BN涂层刀具。结果表明,c-BN薄膜的高硬度和低摩擦特性有助于降低切削力等切削性能。(3)为了提高c-BN薄膜的摩擦学寿命,成功地制备了c-BN/TiN多层膜。多层的总厚度为约2.0微米。(4)为了进一步阐明c-BN薄膜的摩擦学性能,研究了其在不同环境下的摩擦学性能。在真空、高湿和水环境中获得了低摩擦特性。(5)c-BN薄膜与钛合金的摩擦性能较低。(6)成功地在原子力显微镜用芯片基片上制备了c-BN薄膜。
项目成果
期刊论文数量(0)
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渡部修一他: "イオン注入した立方晶室化ホウ素膜の膜構造" 日本化学会第73回秋季年会講演予稿集. 125 (1997)
Shuichi Watanabe 等:“离子注入立方硼薄膜的膜结构”日本化学会第 73 届秋季年会论文集 125(1997)。
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Shuichi Watanabe, Shojiro Miyake and Masao Murakawa: "Tribological Performance of Cubic BN Films" Diamond Films and Technology. Vol.7, No.2. 139-156 (1997)
Shuichi Watanabe、Shojiro Miyake 和 Masao Murakawa:“立方氮化硼薄膜的摩擦学性能”金刚石薄膜和技术。
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三宅正次郎、渡部修一他: "立方晶室化ホウ素膜の水による境界潤滑特性" トライボロジー会議平成10年春 東京. (発表予定).
Shojiro Miyake、Shuichi Watanabe 等人:“由于水而导致的立方硼膜的边界润滑特性”,摩擦学会议,1998 年春季,东京(预定演讲)。
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三宅正二郎,渡部修一他: "c-BNコーテッドチップの形成とそのナノ加工特性" 表面技術協会第99回講演大会要旨集. 191-192 (1999)
Shojiro Miyake、Shuichi Watanabe 等人:“c-BN 涂层芯片的形成及其纳米加工性能”第 99 届表面技术协会会议摘要 191-192 (1999)。
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渡部修一 他: "cBN/TiN層の積層による硬質膜の形成" 第12回ダイヤモンドシンポジウム講演要旨集. 126-127 (1998)
Shuichi Watanabe 等人:“通过堆叠 cBN/TiN 层形成硬膜”第 12 届钻石研讨会摘要 126-127(1998 年)。
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WATANABE Shuichi其他文献
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{{ truncateString('WATANABE Shuichi', 18)}}的其他基金
Active Control on Surface Free Energy of DLC Films
DLC薄膜表面自由能的主动控制
- 批准号:
25420095 - 财政年份:2013
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$ 1.09万 - 项目类别:
Grant-in-Aid for Scientific Research (C)
Estimate of uptake CO2 near the Kerguelen Plateau, Sothern Ocean by the high frequency observation
南洋凯尔盖朗高原附近高频观测CO2吸收量估算
- 批准号:
23241014 - 财政年份:2011
- 资助金额:
$ 1.09万 - 项目类别:
Grant-in-Aid for Scientific Research (A)
DevelopmentofHeat-Resistant Hard CarbonFilmsUtilizedFor Tribological Usages
用于摩擦学用途的耐热硬碳薄膜的开发
- 批准号:
22560147 - 财政年份:2010
- 资助金额:
$ 1.09万 - 项目类别:
Grant-in-Aid for Scientific Research (C)
Development of high-performance tribological coatings by means of plasma-based ion implantation and deposition process
通过等离子体离子注入和沉积工艺开发高性能摩擦涂层
- 批准号:
19560148 - 财政年份:2007
- 资助金额:
$ 1.09万 - 项目类别:
Grant-in-Aid for Scientific Research (C)
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