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DevelopmentofHeat-Resistant Hard CarbonFilmsUtilizedFor Tribological Usages

DevelopmentofHeat-Resistant Hard CarbonFilmsUtilizedFor Tribological Usages
用于摩擦学用途的耐热硬碳薄膜的开发
批准号:
22560147
负责人:
WATANABE Shuichi
金额:
$2.75万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2010
资助国家:
日本
项目状态:
已结题
起止时间:
2010 至 2012

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中文摘要
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英文摘要
In this study , the silicon- and oxygen- doped, and the silicon- andnitrogen- doped diamond-like carbon (Si-O-DLC and Si-N-DLC) films are chosen to takeinto account the thermal stability and Tribological performance compared with pure DLC.The results indicate that Si-N-DLC films present the better thermal stability due to thepresence of Si-O network in the films. Furthermore, Si-O-DLC and Si-N-DLC films exhibitthe excellent Tribological performance. It can be concluded that Si-O-DLC and Si-N-DLCfilms can improve the thermal stability and Tribological performance.
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ESRStudy of Elements Added-DLC Films Depositedby PBII and RF-CVD Methods
PBII和RF-CVD方法沉积添加元素的DLC薄膜的ESR研究
DOI: --
发表时间: 2010
期刊: Advance inScience and Technology
影响因子: --
作者: [N. Moolsradoo, H. Sato and S. Watanabe]
通讯作者: H. Sato and S. Watanabe
PBII 法による DLC-Si-N 膜の形成
PBII法形成DLC-Si-N薄膜
DOI: --
发表时间: 2012
期刊:
影响因子: --
作者: [李祥暉, 遠藤壮人, 渡部修一]
通讯作者: 渡部修一
C-Si-O系薄膜のESR評価
C-Si-O薄膜的ESR评估
DOI: --
发表时间: 2011
期刊:
影响因子: --
作者: [佐藤浩史, ナッタナン ムルスラドゥ, 渡部修一]
通讯作者: 渡部修一
C-Si-O系薄膜のトライボロジー特性
C-Si-O薄膜的摩擦学性能
DOI: --
发表时间: 2010
期刊:
影响因子: --
作者: [ナッタナン ムルスラドゥ, 安部慎也, 渡部修一]
通讯作者: 渡部修一
28
    Active Control on Surface Free Energy of DLC Films
    • 批准号:
      25420095
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $2.5万
    • 财政年份:
      2013
    • 负责人:
      WATANABE Shuichi
    • 依托单位:
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    • 批准号:
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    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
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    • 财政年份:
      2007
    • 负责人:
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    • 批准号:
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    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
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    • 财政年份:
      1997
    • 负责人:
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    • 依托单位:
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