DevelopmentofHeat-Resistant Hard CarbonFilmsUtilizedFor Tribological Usages
DevelopmentofHeat-Resistant Hard CarbonFilmsUtilizedFor Tribological Usages
批准号:
22560147
负责人:
WATANABE Shuichi
金额:
$2.75万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2010
资助国家:
日本
项目状态:
已结题
起止时间:
2010 至 2012
中文摘要
点击翻译按钮获取中文摘要
英文摘要
In this study , the silicon- and oxygen- doped, and the silicon- andnitrogen- doped diamond-like carbon (Si-O-DLC and Si-N-DLC) films are chosen to takeinto account the thermal stability and Tribological performance compared with pure DLC.The results indicate that Si-N-DLC films present the better thermal stability due to thepresence of Si-O network in the films. Furthermore, Si-O-DLC and Si-N-DLC films exhibitthe excellent Tribological performance. It can be concluded that Si-O-DLC and Si-N-DLCfilms can improve the thermal stability and Tribological performance.
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
登录
查看更多内容
ESRStudy of Elements Added-DLC Films Depositedby PBII and RF-CVD Methods
PBII和RF-CVD方法沉积添加元素的DLC薄膜的ESR研究
DOI:
--
发表时间:
2010
期刊:
Advance inScience and Technology
影响因子:
--
作者:
[N. Moolsradoo, H. Sato and S. Watanabe]
通讯作者:
H. Sato and S. Watanabe
PBII 法による DLC-Si-N 膜の形成
PBII法形成DLC-Si-N薄膜
DOI:
--
发表时间:
2012
期刊:
影响因子:
--
作者:
[李祥暉, 遠藤壮人, 渡部修一]
通讯作者:
渡部修一
C-Si-O系薄膜のESR評価
C-Si-O薄膜的ESR评估
DOI:
--
发表时间:
2011
期刊:
影响因子:
--
作者:
[佐藤浩史, ナッタナン ムルスラドゥ, 渡部修一]
通讯作者:
渡部修一
C-Si-O系薄膜のトライボロジー特性
C-Si-O薄膜的摩擦学性能
DOI:
--
发表时间:
2010
期刊:
影响因子:
--
作者:
[ナッタナン ムルスラドゥ, 安部慎也, 渡部修一]
通讯作者:
渡部修一
C-Si-O系薄膜の形成とその機械的特性
C-Si-O薄膜的形成及其力学性能
DOI:
--
发表时间:
2010
期刊:
影响因子:
--
作者:
[ナッタナン ムルスラドゥ, 安部慎也, 渡部修一]
通讯作者:
渡部修一
共 28 条
Active Control on Surface Free Energy of DLC Films
-
批准号:25420095
-
项目类别:Grant-in-Aid for Scientific Research (C)
-
资助金额:$2.5万
-
财政年份:2013
-
负责人:WATANABE Shuichi
-
依托单位:
Estimate of uptake CO2 near the Kerguelen Plateau, Sothern Ocean by the high frequency observation
-
批准号:23241014
-
项目类别:Grant-in-Aid for Scientific Research (A)
-
资助金额:$31.95万
-
财政年份:2011
-
负责人:WATANABE Shuichi
-
依托单位:
Development of high-performance tribological coatings by means of plasma-based ion implantation and deposition process
-
批准号:19560148
-
项目类别:Grant-in-Aid for Scientific Research (C)
-
资助金额:$2.58万
-
财政年份:2007
-
负责人:WATANABE Shuichi
-
依托单位:
Study on Application of Cubic Boron Nitride Films
-
批准号:09650169
-
项目类别:Grant-in-Aid for Scientific Research (C)
-
资助金额:$1.09万
-
财政年份:1997
-
负责人:WATANABE Shuichi
-
依托单位:
海外基金