Fabrication and analysis of fiber-integrated micro-optical switches
Fabrication and analysis of fiber-integrated micro-optical switches
批准号:
09650339
负责人:
HANAIZUMI Osamu
金额:
$2.05万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1997
资助国家:
日本
项目状态:
已结题
起止时间:
1997 至 1998
中文摘要
3D光子晶体可用于控制来自由III V族化合物半导体制成的有源区的辐射方向。这对于获得高效的光纤集成微型光开关是有用的。我们在三维光子晶体中制作了光波导,并观察了光束的传播。波长为1.15 μ m的光束沿着在3D光子晶体中形成的线缺陷传播。三维光子晶体是在周期性镂空的三角晶格二氧化硅衬底上,用射频偏压溅射法制备的a-Si/SiO_2多层膜交替叠层而成。凹坑直径为0.2 μ m,点阵间距为0.5 μ m,层厚为0.2 μ m,在对应于芯的某一区域省略了光刻图形的衬底上,用10个周期的a-Si/SiO_2多层膜叠层,形成垂直于表面的线缺陷。垂直于表面的透射率的测量结果表明,用于观察传播的1.15 μ m的波长是在对应于芯的一维(iD)周期性区域的通带和对应于包层的3D周期性区域的阻带中。测量结果与时域有限差分(FDTD)计算结果吻合良好。
英文摘要
3D photonic crystals are useful to control the direction of radiation from the active regions made of III V compound semiconductors. It is useful to obtain highly efficient fiber-integrated micro optical switches. We have fabricated optical waveguides in three-dimensional (3D) photonic crystals and observed propagation of light beams. Light beams with wavelengths of 1.15 mum propagate along the line defects formed in the 3D photonic crystals. The 3D photonic crystals consist of a-Si/SiO_2 multilayers laminated alternately by rf bias sputtering on a periodically hollowed silica substrate with a triangular lattice. The pit diameter is 0.2 p.m and the pitch of the lattice is 0.5 p.m. The thickness of each laminated layer is 0.2 p.m. Line defects are formed normal to the surface by laminating a-Si/SiO_2 multilayers with 10 periods on the substrate in which the corrugation patterns have been omitted in a certain area corresponding to the core. The measurements of transmittance normal to the surface show that the wavelength of 1.15 mum used in observation of propagation is in the passband for the one-dimensional (iD) periodic region corresponding to the core and in the stop band for the 3D periodic region corresponding to the cladding, respectively. Measurements show good agreement with finite-difference time-domain(FDTD) calculations.
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土岐 和啓: "光励起MQW面型光増幅器の作製と評価" 応用物理学会秋季学術講演会. 3a-ZC-7. 1107 (1997)
Kazuhiro Toki:“光泵浦MQW表面型光放大器的制造和评估”日本应用物理学会秋季学术会议3a-ZC-7(1997)。
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佐藤 尚: "積層形偏光分離素子の2次元光回路へのハイブリッド集積" 電子情報通信学会論文誌C-I. J81-C-I 2巻. (1998)
Takashi Sato:“将堆叠偏振分离元件混合集成到二维光学电路中”IEICE Transactions C-I 第 2 卷(1998 年)。
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O.Hanaizumi: "Optical waveguides in a-Si/SiO_2 subniciometer 3D phatonic crystals :Fabrication and observation" CLEQ/Europe '98. CPD2.5. なし (1998)
O.Hanaizumi:“a-Si/SiO_2 亚微米 3D 声子晶体中的光波导:制造和观察”CLEQ/Europe 98 无 (1998)。
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S.Kawakami, T.Kawashima, and T.Sato: "Mechanism of shape-formation of 3D periodic nanostructures by bias sputtering" Appl.Phys.Lett., Jan.1999. vol.74, no.3. 463-465 (1999)
S.Kawakami、T.Kawashima 和 T.Sato:“通过偏置溅射形成 3D 周期性纳米结构的形状形成机制”Appl.Phys.Lett.,1999 年 1 月。
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O.Hanaizumi: "Propagation of liglit beans along line defects formed in a-Si/SiO_2 three-dimenlional photoic uystals : Fabucatien and obseruation" Applied Physios Letteis. Vol.74 no.6. 777-779 (1999)
O.Hanaizumi:“沿着a-Si/SiO_2 三维光子晶体中形成的线缺陷传播光豆:Fabucatien 和观察”Applied Physios Letteis。
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共 23 条
Study on fabrication technology of high-density silicon nanocrystals and its application to photonics elements
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批准号:20560316
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$3.0万
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财政年份:2008
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负责人:HANAIZUMI Osamu
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依托单位:
Research on technology for integrating silicon nanocrystals into photonic crystals and its application to optical devices
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批准号:17360153
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$9.37万
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财政年份:2005
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负责人:HANAIZUMI Osamu
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Investigation of mechanism of bias sputtering causing autocloning
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批准号:14205054
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$24.21万
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财政年份:2002
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负责人:HANAIZUMI Osamu
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依托单位:
Fabrication of three-dimensional photonic crystals by autocloning
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批准号:11450132
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$9.98万
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财政年份:1999
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负责人:HANAIZUMI Osamu
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依托单位: