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Study on Micro-machining Using a Small Particle Controlled by Optical Pressure.

Study on Micro-machining Using a Small Particle Controlled by Optical Pressure.
利用光压控制小颗粒进行微加工的研究。
批准号:
09450060
负责人:
MIYOSHI Takashi
金额:
$8.32万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
1997
资助国家:
日本
项目状态:
已结题
起止时间:
1997 至 1999

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中文摘要
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英文摘要
This paper presents a new micromachining using a small particle controlled by optical radiation pressure induced by focused laser light, which is based on laser trapping technology. It is known that the particle of several micrometer can be trapped and moved in liquid by optical radiation pressure force, which is as small as pN to nN. it is so called laser trapping technology. We propose the new micromachining using a small dielectric particle, like a diamond grain or a silica sphere, controlled by optical radiation pressure as a machining tool. In order to verify the feasibility of our proposed micromachining, at first, we perform computer simulation of trapping force. The simulation results suggest that the objective with larger numerical aperture and the particles with larger refractive index are suitable for this micromachining. Second, we construct the experimental system and carry out the fundamental experiments based on the simulation results. The laser trapped diameter grain is moved at the constant path in hundreds of times on the silicon wafer surface in machining liquid. After that, the surface to be machined is observed by using AFM. From the AFM image, it is found that the diamond grain removes the silicon wafer surface with the depth of several nanometer, even if the pressure force is as a small as 0.1nN. Furthermore, it is suggested that rotating diamond grain is more efficient for micromachining than non-rotating diamond grain, and that even a silica sphere with smaller refractive index will be able to perform micromachinng for the surface with low mechanical strength.
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通讯作者:
DEVELOPMENT OF THE NANO-CMP PROCESS APPARATUS CONTROLLED BY OPTICAL RADISTION PRESSURE
  • 批准号:
    13355006
  • 项目类别:
    Grant-in-Aid for Scientific Research (A)
  • 资助金额:
    $30.04万
  • 财政年份:
    2001
  • 负责人:
    MIYOSHI Takashi
  • 依托单位:
Study on Nano-inprocess measurement of CMP defects on SiO2 filmed wafer surface
  • 批准号:
    12450060
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
  • 资助金额:
    $7.87万
  • 财政年份:
    2000
  • 负责人:
    MIYOSHI Takashi
  • 依托单位:
Nano In-Process Measurement of 3D Micro-Profile Using Optical Inverse Scattering
  • 批准号:
    11555043
  • 项目类别:
    Grant-in-Aid for Scientific Research (B).
  • 资助金额:
    $6.59万
  • 财政年份:
    1999
  • 负责人:
    MIYOSHI Takashi
  • 依托单位:
Development of Laser Trapping Probe for The Nano-CMM
  • 批准号:
    09555044
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
  • 资助金额:
    $6.59万
  • 财政年份:
    1997
  • 负责人:
    MIYOSHI Takashi
  • 依托单位:
海外基金