X-Ray Nanolithography Facility: Towards the ultimate resolution

X 射线纳米光刻设备：迈向终极分辨率

• 批准号: LE200100174
• 负责人: Dr Grant Van Riessen
• 金额: $ 28.34万
• 依托单位: La Trobe University
• 依托单位国家: 澳大利亚
• 项目类别: Linkage Infrastructure, Equipment and Facilities
• 财政年份: 2020
• 资助国家: 澳大利亚
• 起止时间: 2020-11-30 至 2022-12-31
• 项目状态: 已结题
• 来源: https://dataportal.arc.gov.au/RGS/Web/Grants/LE200100174
• 关键词: Ray; Nanolithography; Facility; Towards; ultimate

This Project aims to address the need for precise and scalable nanoscale fabrication by establishing a synchrotron-based X-Ray Nanolithography Facility. This Project expects to generate new knowledge in the areas of advanced manufacturing and nanotechnology using an innovative approach that combines coherent lithography and coherent imaging metrology. Expected outcomes of this project include an internationally unique, nationally accessible capability for manufacturing at the nanoscale and for industry-driven collaborative research. This should provide significant benefits across fields that aim to harness the unique properties of engineered nanomaterials to greatly enhance the technologies required to solve global challenges.

该项目旨在通过建立基于同步加速器的X射线纳米光刻设施来满足精确和可扩展的纳米级制造的需求。 该项目预计将在先进制造和纳米技术领域产生新的知识，采用创新的方法，结合相干光刻和相干成像计量。该项目的预期成果包括国际上独特的、国家可获得的纳米级制造能力和行业驱动的合作研究能力。这将为旨在利用工程纳米材料的独特特性的各个领域带来重大利益，从而大大增强解决全球挑战所需的技术。