Correlative Chemical Metrology
Correlative Chemical Metrology
批准号:
EP/X019071/1
负责人:
John Walker
金额:
$25.74万
依托单位国家:
英国
项目类别:
Research Grant
财政年份:
2023
资助国家:
英国
项目状态:
未结题
起止时间:
2023 至 --
中文摘要
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英文摘要
The interaction of surfaces is fundamental to how we live our lives. How surfaces behave when they move against each other as part of engineered components in machines depends to a large extend on what they are made from and how they are made. This is important because surfaces made from the wrong material or the wrong surface finish could cause the component to fail before it was designed to do so. This leads to a cost penalty for repair and replacement but there is also the additional energy wastage incurred as the material needs to be recycled and re-made. Thus measuring surface composition and roughness is quite important but to do so accurately involves lots of different scientific techniques which can make it time consuming and expensive. It would be much better from a sustainability perspective if surfaces could be measured quickly and accurately when they were being made at a relatively low cost to give information about both their composition and roughness.This project aims to try and achieve this goal by combining two scientific techniques into one sensor measurement. Roughness is often measured by tracing a diamond tip across a surface to measure differences in height. Diamond is a good material for doing this as it is very hard and is not easily damaged when in contact with surfaces. Diamond is an insulator but this can be changed if it is doped with boron. This makes the diamond conductive and means we could potentially use a technique called electrochemical impedance spectroscopy, or EIS, to measure changes in the contact resistance at different AC frequencies (called the impedance) between the diamond and an engineered surface like a steel. The impedance is likely to change as the probe moves across different parts of the steel structure, for example, it will probably be different for the iron part of the steel compared to a part that has lots of carbon in it. This means we might be able to correlate the high and low points of the roughness to the different materials phases of a surface.It will be quite challenging to achieve this as EIS take several minutes to scan all the AC frequencies, but measuring the topography only takes a few seconds. The influence of vibrations, thermal drift and relative humidity will need to be taken account of when the measurement is performed. The data will be collected from a very sensitive nano-indentation machine that uses capacitance plates to provide very accurate data of surface positions. The amount of water in the air when the measurements are taken will be controlled with a chamber than can be filled with dry nitrogen. This is because water in the air will desorb near the probe when the measurements are made and could allow impedance of ambient surfaces to be measured.If the technique were to work it could be very useful across a number of different sectors. These include manufacturing, where it might be used as a quality control device, checking that manufactured components have been made to the correct surface roughness and that no contamination of the surface is present. When some manufacturing processes go wrong they sometimes 'burn' or oxide the surface and this new sensor might be capable of detecting that before a human notices. Other sectors that could benefit would be the chemical industry, especially the catalysis sector, where the surface area of different catalytic species could be correlated to surface height, allowing optimisation for particular applications. This approach would also be relevant to engineering components that experience sliding or rolling contacts as the technique could determine how surfaces change in response to damage accumulation. This could be from both a surface engineering design optimisation point of view or indeed as a condition monitoring approach, where the surfaces are measuring in-situ within their application environment to warn of potential problems developing during operation.
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Mitochondrial ATP synthase: cellular power generator, determinant of mitochondrial cristae formation, a site linked to human diseases
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批准号:MC_UU_00028/9
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项目类别:Intramural
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资助金额:$49.69万
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财政年份:2022
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负责人:John Walker
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依托单位:
Assembly of human ATP synthase
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批准号:MR/V009672/1
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项目类别:Research Grant
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资助金额:$107.24万
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财政年份:2020
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负责人:John Walker
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依托单位:
In-situ profilometry for transient testing of automotive materials
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批准号:EP/P024475/1
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项目类别:Research Grant
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资助金额:$12.82万
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财政年份:2017
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负责人:John Walker
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依托单位:
Structure, mechanisms, regulation and assembly of ATP synthase
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批准号:MC_EX_MR/M009858/1
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项目类别:Research Grant
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资助金额:$317.9万
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财政年份:2015
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负责人:John Walker
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依托单位:
Collaborative Research on Plant Stress Response Through Innovations in Phenomics and Molecular Imaging Technologies
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批准号:1430428
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项目类别:Cooperative Agreement
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资助金额:$285.0万
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财政年份:2014
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负责人:John Walker
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依托单位:
The Missouri Transect: Climate, Plants, and Community
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批准号:1355406
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项目类别:Cooperative Agreement
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资助金额:$2000.0万
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财政年份:2014
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负责人:John Walker
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依托单位:
Planning Grant for EPSCoR Missouri
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批准号:1226306
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项目类别:Standard Grant
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资助金额:$24.98万
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财政年份:2012
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负责人:John Walker
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依托单位:
Conference: Symposium on Plant Protein Phosphorylation, May 26-28, Columbia, MO
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批准号:1019114
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项目类别:Standard Grant
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资助金额:$1.0万
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财政年份:2010
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负责人:John Walker
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依托单位:
The Creation and Management of the Southwest Amazon: Landscape and Sociopolitical Organization in the Llanos de Mojos, Bolivia
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批准号:1026529
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项目类别:Continuing Grant
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资助金额:$11.15万
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财政年份:2010
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负责人:John Walker
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依托单位:
Reaching Out to Aerospace Technology
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批准号:0903212
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项目类别:Standard Grant
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资助金额:$15.0万
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财政年份:2009
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负责人:John Walker
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依托单位:
SBIR Phase I: A Miniaturized Sensor for Determining the Optical Properties of Aerosols
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批准号:0839402
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项目类别:Standard Grant
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资助金额:$10.0万
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财政年份:2009
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负责人:John Walker
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依托单位:
Signal Transduction and the Regulation of Organ Abscission in Arabidopsis
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批准号:0743955
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项目类别:Continuing Grant
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资助金额:$55.3万
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财政年份:2008
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负责人:John Walker
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依托单位:
SGER: Rotating Magnetic Fields in Semiconductor Crystal Growth
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批准号:0346302
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项目类别:Standard Grant
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资助金额:$7.69万
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财政年份:2004
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负责人:John Walker
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依托单位:
Magnetic Fields in Semiconductor Crystal Growth
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批准号:0129028
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项目类别:Standard Grant
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资助金额:$8.55万
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财政年份:2002
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负责人:John Walker
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依托单位:
Functional Analysis of the Forkhead Associated Domain in Arabidopsis Thaliana
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批准号:0112278
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项目类别:Continuing Grant
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资助金额:$37.5万
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财政年份:2001
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负责人:John Walker
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依托单位:
Functional Genomics of Plant Phosphorylation
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批准号:9975808
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项目类别:Continuing Grant
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资助金额:$298.37万
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财政年份:1999
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负责人:John Walker
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依托单位:
Transmembrane Signaling by Receptor Protein Kinases in Plants
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批准号:9809884
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项目类别:Continuing Grant
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资助金额:$33.6万
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财政年份:1998
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负责人:John Walker
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依托单位:
Renovation and Modernization of Plant Growth Facilities at the University of Missouri-Columbia
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批准号:9602285
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项目类别:Standard Grant
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资助金额:$100.0万
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财政年份:1997
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负责人:John Walker
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依托单位:
Models of Electromagnetic Flow Control During Bulk Growth of Semiconductor Crystals
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批准号:9419484
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项目类别:Continuing Grant
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资助金额:$24.49万
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财政年份:1995
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负责人:John Walker
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依托单位:
Autoradiographic Phosphorimaging System
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批准号:9317489
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项目类别:Standard Grant
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资助金额:$5.14万
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财政年份:1994
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负责人:John Walker
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依托单位:
国内基金
海外基金
Chinese Journal of Chemical Engineering
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批准号:21224004
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项目类别:专项基金项目
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资助金额:20.0万元
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批准年份:2012
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负责人:廖叶华
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依托单位:
Chinese Journal of Chemical Engineering
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批准号:21024805
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项目类别:专项基金项目
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资助金额:20.0万元
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批准年份:2010
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负责人:廖叶华
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依托单位: