Scalable manufacture and device integration of novel 2D materials & heterostructures
Scalable manufacture and device integration of novel 2D materials & heterostructures
批准号:
1772057
负责人:
金额:
$0.0万
依托单位:
依托单位国家:
英国
项目类别:
Studentship
财政年份:
2016
资助国家:
英国
项目状态:
已结题
起止时间:
2016 至 --
中文摘要
博士项目旨在主要使用化学气相沉积,以研究和改进石墨烯和六方氮化硼的制造技术。即使是最常用的过渡金属表面上的这些二维薄膜的生长机制也没有得到很好的理解,该项目旨在提高石墨烯和碳纳米技术领域的知识和技术。最初,该项目将专注于将这些二维薄膜集成到光电器件中,使用原位生长计量学来获得对生长过程的宝贵见解。这不仅将为材料的电子特性提供有价值的见解,而且有助于光电子器件和电路的研究,还计划研究和改进石墨烯的化学转化,以形成含有硼,氮和碳的各种原子层。一旦确定了生长策略,重点将转向调整材料的电阻、载流子迁移率和介电强度等电子特性。
英文摘要
The PhD project aims to use primarily Chemical Vapour Deposition in order to study and improve the manufacturing technologies of Graphene and hexagonal Boron Nitride. The growth mechanisms of these 2D films on even the most commonly used transition metal surfaces are not well understood and this project seeks to improve the knowledge and techniques used in the area of Graphene and carbon nanotechnology.Initially the project will focus on the integration of these 2D films into optoelectronic devices, using in-situ growth metrology to gain valuable insight into the growth process. This will not only provide valuable insight into the electronic properties of the materials, but contribute to the study of Optoelectronic devices and circuitsThere are also plans to study and refine the chemical conversion of graphene in order to form various atomic layers containing boron, nitrogen and carbon. Once a growth strategy is identified the focus will turn to tuning the electronic properties such as resistance, carrier mobilities and dielectric strength of the material.
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DOI:
10.1088/2053-1583/ab6269
发表时间:
2020-01
期刊:
2D Materials
影响因子:
5.5
作者:
[V. Babenko;Ye Fan;Vlad-Petru Veigang-Radulescu;B. Brennan;A. Pollard;Oliver J. Burton;J. Alexander-Webber;R. Weatherup;B. Canto;M. Otto;D. Neumaier;S. Hofmann]
通讯作者:
V. Babenko;Ye Fan;Vlad-Petru Veigang-Radulescu;B. Brennan;A. Pollard;Oliver J. Burton;J. Alexander-Webber;R. Weatherup;B. Canto;M. Otto;D. Neumaier;S. Hofmann
DOI:
10.1021/acs.chemmater.0c02296
发表时间:
2020-09-22
期刊:
Chemistry of materials : a publication of the American Chemical Society
影响因子:
--
作者:
[Braeuninger-Weimer P, Burton OJ, Zeller P, Amati M, Gregoratti L, Weatherup RS, Hofmann S]
通讯作者:
Hofmann S
DOI:
10.1021/acs.jpcc.9b03808
发表时间:
2019-07-04
期刊:
JOURNAL OF PHYSICAL CHEMISTRY C
影响因子:
3.7
作者:
[Burton, Oliver J., Babenko, Vitaliy, Hofmann, Stephan]
通讯作者:
Hofmann, Stephan
Integrated Growth and Process Technology for Atomically Thin Single Crystal Films
原子级薄单晶薄膜的集成生长和加工技术
DOI:
10.17863/cam.65131
发表时间:
2020
期刊:
影响因子:
--
作者:
[Burton O]
通讯作者:
Burton O
DOI:
10.1063/1.5098351
发表时间:
2019-07-01
期刊:
APL MATERIALS
影响因子:
6.1
作者:
[Braeuninger-Weimer, Philipp, Burton, Oliver, Hofmann, Stephan]
通讯作者:
Hofmann, Stephan
海外基金