Infrared Thermophotovoltaic (TPV) cell for power generation and energy harvesting
Infrared Thermophotovoltaic (TPV) cell for power generation and energy harvesting
批准号:
2268865
负责人:
金额:
$0.0万
依托单位:
依托单位国家:
英国
项目类别:
Studentship
财政年份:
2019
资助国家:
英国
项目状态:
已结题
起止时间:
2019 至 --
中文摘要
(a)科学卓越:有限的能源资源和全球变暖的压力要求工业减少其净能源或“碳足迹”。考虑到制造过程中60%的能量被浪费为热量,这引发了人们对温度<1000K的热能清除和全球热光伏(TPV)设备开发的兴趣。早在2008年,技术战略委员会(TSB)和EPSRC就投资了300万英镑创建了冠热管研发联盟(兰开斯特),并于2015年报告了英国首次展示的InAs冠热管(合著者,Kesaria)。然而,InAs和后续基于insb的器件存在严重的温度不稳定性,并且需要后续的冷却,从而使这些器件消耗净能量。最近,一种新的化合物半导体,InN,已经从理论上预测(2017,MIT),具有热稳定的晶体结构和光谱响应,具有强大的非冷却性能。到目前为止,还没有二极管的演示报告为博士研究创造了丰富的学术探索/发展场景。为了支持这项研究,Kesaria博士和共同导师Min Gao教授很好地利用III-N分子束外延(MBE), ICS制造和卡迪夫设备和材料表征设施来探索这一机会。项目目标、方法、成果:研究黑体响应~1000K的温度稳定TPVs。该学生将开发利用MBE生长InN材料的新方法,然后在Ser-Cymru实验室通过XRD, PL和FTIR表征其结构,光学性质。在器件模拟(Sentaurus, Gao)和掺杂研究之后,p-i-n结构被生长,制造成台面二极管并表征。在高教授的实验室里,特殊的闪光测试i -v将检查短路和开路电压增强。科学挑战:突破机会包括掺杂研究(InN本质上是n型),二极管钝化(蚀刻侧壁表面积累)和InN热稳定TPV演示(迄今为止)。(b) 3.5年内完成的可行性:项目分为四个阶段(yr0 -0.5)文献检索、MBE、洁净室、Sentaurus培训(yr0.5-1.5) Si外延、掺杂研究、TPV建模(yr1.5-2.5)器件开发;(yr2.5-3.5)设备演示,报告,viva。
英文摘要
(a) Scientific excellence: Limited energy resources and pressures of global warming require industry to reduce its net-energy or "carbon footprint". Given that >60% of energy in manufacturing is wasted as heat has triggered interest in thermal-energy scavenging for temperatures <1000K and worldwide development of thermophotovoltaic (TPV) devices. As early as 2008, Technology Strategy Board (TSB) and EPSRC invested ~£3M creating TPV R&D consortium (Lancaster) with UK first demonstration of InAs TPVs reported in 2015 (co-author, Kesaria). However, the InAs and subsequent InSb-based devices suffer from severe temperature instabilities and require subsequent cooling rendering these devices net-energy-consuming. Recently, a new compound semiconductor, InN, has been theoretically predicted (2017, MIT) with both thermally-stable crystal structure and spectral response promising robust, un-cooled performance. To date, no diode demonstration has been reported creating a scenario for rich academic exploration/development for PhD study. In support of this studentship, Dr. Kesaria and co-supervisor Prof. Min Gao, are well-placed to explore this opportunity utilising III-N molecular beam epitaxy (MBE), ICS fabrication and Cardiff device and materials characterization facilities. Project aims, methods, outcomes: The studentship aims to demonstrate temperature-stable TPVs with blackbody response ~1000K. The student will develop new methods to grow InN material using MBE then characterise its structure, optical properties by XRD, PL and FTIR in Ser-Cymru laboratory. Following device simulation (Sentaurus, Gao) and doping studies, a p-i-n structure is grown, fabricated into mesa diodes and characterised. Special flash-test I-Vs will check short-circuit and open-voltage enhancement in Prof Gao's lab. Scientific challenges: Breakthrough opportunities include doping studies (InN is intrinsically n-type), diode passivation (surface accumulation at etched-sidewalls) and InN thermally-stable TPV demonstration (first to date).(b)Feasibility of completion within 3.5years: The project has four stages (yr0.0-0.5)literature search, MBE, cleanroom, Sentaurus training (yr0.5-1.5)InN on Si epitaxy, doping studies, TPV modelling (yr1.5-2.5)device development; (yr2.5-3.5)device demonstrations, reporting, viva.
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
海外基金