Access to Nanoscience and Nanotechnology Equipment at Cardiff

这项免费使用纳米技术设施的计划，其中一些在英国是独一无二的，将由卡迪夫大学（CU）的制造工程中心（MEC）协调。该中心是由EPSRC资助的CU创新制造研究中心（CUIMRC）的一部分，在过去的六年里一直是威尔士技术和工业合作卓越中心（CETIC），并且是DTI制造咨询服务（MAS）第一阶段的制造卓越中心。2001年，MEC启动了微纳米制造（MNM）研发计划，重点是微纳米系统的先进制造研究，这是英国技术战略的优先领域之一。2005年，为了表彰其在微纳米技术方面的研究成就和最先进的设施，该中心成为英国MNT网络的主要节点之一，并获得了DTI和威尔士议会政府的350万资本赠款。目前，MEC MNM计划包括两个国家和八个EC资助的研究项目，总预算超过11 M。国家的最先进的纳米科学和纳米技术设备，支持MEC MNM计划将通过该计划提供给英国的学术界。该计划下提供的研发服务将集中在制造，加工和表征过程中被确定为有最大的需求NanoEquip 2007，最近进行的调查由EPSRC。特别是，以下服务将通过该计划提供给英国学术界。蔡司XB 1540（50%备用能力）：二维和三维FIB纳米结构/光刻; FIB铣削与同步扫描电镜; FIB辅助材料沉积;纳米器件、NEMS和纳米电子学的原型制作和小批量制造;显微镜样品制备;原子探针分析样品制备; TEM薄片制备;高级成像和成分分析（EDX、EBSD和STEM）; 2D和3D复制母版的制作;半导体器件的故障分析和修复;带FE发射极的高分辨率SEM。Imprio 55（60%）：在4“和8”晶片上UV压印纳米结构;批量制造平面纳米器件，例如FET，传感器和光学元件;开发新的UV可固化功能材料，例如有机半导体。XE-100（60%）：用于制造纳米器件的纳米光刻;用于表征纳米结构和纳米颗粒的AFM/STM成像;纳米材料的结构和形态表征。MicroXAM-100-HR（60%）：在垂直范围内具有纳米分辨率的3D轮廓测量;材料失效分析;从1 nm到3 mm的台阶高度测量。SA/1 m（60%）：从UV压印母版制造镍纳米器件;制造热压印母版。Mikrotechnik HEX 03（60%）：在有机薄片上热压印纳米结构;批量制造平面纳米器件，例如FET，传感器和光学元件;表征新的功能有机材料，例如有机半导体。微系统50（60%）：在热塑性塑料中复制纳米结构;表征用于纳米结构/纳米器件系列制造的新功能热塑性塑料。

This programme for free access to nanotechnology facilities, some of which unique in the UK, will be coordinated by the Manufacturing Engineering Centre (MEC) at Cardiff University (CU). The Centre is part of the CU Innovative Manufacturing Research Centre (CUIMRC) funded by the EPSRC, and has been a Centre of Excellence for Technology and Industrial Collaboration (CETIC) in Wales in the last six years and was a Centre for Manufacturing Excellence in Phase 1 of the DTI Manufacturing Advisory Service (MAS). In 2001, the MEC initiated a Micro and Nano Manufacturing (MNM) R&D programme with a focus on advanced manufacturing research for micro and nano-systems, one of the priority areas in the UK Technology Strategy. In 2005, in recognition of its research achievements and state-of-the-art facilities in Micro and Nano Technology the Centre became one of the main nodes within the UK MNT Network with the award of a 3.5M capital grant from the DTI and Welsh Assembly Government. Currently, the MEC MNM programme includes a portfolio of two National and eight EC funded research projects with a total budget in excess of 11M. The state-of-the-art nanoscience and nanotechnology equipment that underpins the MEC MNM programme will be made available through this programme to the academic community in the UK.The R&D services offered under this programme will focus on fabrication, processing and characterisation processes which were identified to have the greatest demand in NanoEquip2007, a recently conducted survey by the EPSRC.. In particular, the following services will be made available to the UK academic community through this programme.- Zeiss XB1540 (50% spare capacity): 2D and 3D FIB nanostructuring/lithography; FIB milling with simultaneous SEM; FIB assisted material deposition; prototyping and small batch fabrication of nanodevices, NEMS and nanoelectronics; preparation of microscopy samples; preparation of specimens for atom probe analysis; preparation of TEM lamellae; advanced imaging and compositional analysis (EDX, EBSD and STEM); fabrication of 2D and 3D replication masters; failure analysis and repair of semiconductor devices; high resolution SEM with FE emitter.- Imprio 55 (60%): UV imprinting of nanostructures on 4'' and 8'' wafers; batch fabrication of planner nanodevices, e.g. FETs, sensors and optical components; development of new UV curable functional materials, e.g. organic semiconductors.- XE-100 (60%): nanolithography for fabrication of nanodevices; AFM/STM imaging for characterisation of nanostructures and nanoparticles; structure and morphology characterisation of nanomaterials.- MicroXAM-100-HR (60%): 3D profiling measurements with nanometre resolution in the vertical range; failure analysis of materials; measurements of step heights from 1 nm to 3 mm.- SA/1m (60%): fabrication of nanodevices in nickel from UV imprinted masters; fabrication of masters for thermal imprinting.- Mikrotechnik HEX03 (60%): thermal imprinting of nanostructures on organic thin sheets; batch fabrication of planar nanodevices, e.g. FETs, sensors and optical components; characterisation of new functional organic materials, e.g. organic semiconductors.- Microsystem 50 (60%): replication of nanostructures in thermoplastics; characterisation of new functional thermoplastics for serial manufacture of nanostructures/nanodevices.