Nanoparticle and Element Distribution Studies of Ion Implantation Processes

离子注入修饰衬底表面和亚表面微观结构是材料和器件技术中的核心技术。特别是，已知离子注入与退火序列的结合可以产生各种各样的纳米结构，从少量原子簇到延伸的纳米颗粒，可通过注入能量和退火参数进行调节。表征技术的进步现在使得在电子显微镜下观察和分析基本的退火步骤成为可能。通过像差校正技术的超高分辨率允许在高对比度情况下接近单原子可见性。另一个主要的技术进步是在TEM测角仪的特殊附件中应用热处理和气体反应细胞。该项目将探索团簇和粒子形成的基础，探索团簇的横向分布及其与离子束参数的关系。将产生的材料和纳米结构范围从金属（例如Zn）到金属氧化物（例如ZnO），到铁磁体（例如Co），可选择各向同性（二氧化硅）和单轴（A1203-0001）衬底。

Ion implantation to modify the surface and sub-surface microstructure of substrates is a core process in materials and device technology. In particular the combination of ion implantation with annealing sequences is known to generate a variety of nanostructures, ranging from clusters of few atoms to extend nanoparticles, tunable by implantation energy and annealing parameters. Progress in characterisation techniques now makes it possible to observe and analyse the essential annealing step inside an electroni microscope. Ultra-high resolution through aberration correction techniques allows approaching single atom visibility for high contrast cases. Another major advance in technology is the aplication of heat treatments and gas reaction cells within special attachments to the TEM goniometer.The project will explore the basics of cluster and particle formation, explore the lateral distribution of clusters, and its relationship to the ion beam parameters. Materials and nanostructures which will be generated range from metals (e.g. Zn) over metal oxides (e.g. ZnO), to ferromagnets (e.g. Co), with a choice of isotropic (silica) and uni-axial (A1203-0001) substrates.