Studies of Radical Intermediates in Hot-Wire Chemical Vapor Deposition of Semiconductor Thin Films
Studies of Radical Intermediates in Hot-Wire Chemical Vapor Deposition of Semiconductor Thin Films
批准号:
299455-2004
负责人:
Shi, Yujun
金额:
$2.91万
依托单位:
依托单位国家:
加拿大
项目类别:
University Faculty Award
财政年份:
2006
资助国家:
加拿大
项目状态:
已结题
起止时间:
2006-01-01 至 2007-12-31
中文摘要
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英文摘要
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
Chemical Vapor Deposition of Si-containing Thin Films and Si Nanostructures: From a molecular-level understanding to applications
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批准号:RGPIN-2019-04845
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项目类别:Discovery Grants Program - Individual
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资助金额:$2.62万
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财政年份:2022
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负责人:Shi, Yujun
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依托单位:
Chemical Vapor Deposition of Si-containing Thin Films and Si Nanostructures: From a molecular-level understanding to applications
-
批准号:RGPIN-2019-04845
-
项目类别:Discovery Grants Program - Individual
-
资助金额:$2.62万
-
财政年份:2021
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负责人:Shi, Yujun
-
依托单位:
Chemical Vapor Deposition of Si-containing Thin Films and Si Nanostructures: From a molecular-level understanding to applications
-
批准号:RGPIN-2019-04845
-
项目类别:Discovery Grants Program - Individual
-
资助金额:$2.62万
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财政年份:2020
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负责人:Shi, Yujun
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依托单位:
Chemical Vapor Deposition of Si-containing Thin Films and Si Nanostructures: From a molecular-level understanding to applications
-
批准号:RGPIN-2019-04845
-
项目类别:Discovery Grants Program - Individual
-
资助金额:$2.62万
-
财政年份:2019
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负责人:Shi, Yujun
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依托单位:
Hot Wire Chemical Vapor Deposition Chemistry in the Gas Phase and on Surfaces
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批准号:RGPIN-2014-04966
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项目类别:Discovery Grants Program - Individual
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资助金额:$3.13万
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财政年份:2018
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负责人:Shi, Yujun
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依托单位:
Hot Wire Chemical Vapor Deposition Chemistry in the Gas Phase and on Surfaces
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批准号:RGPIN-2014-04966
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项目类别:Discovery Grants Program - Individual
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资助金额:$3.13万
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财政年份:2017
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负责人:Shi, Yujun
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依托单位:
Hot Wire Chemical Vapor Deposition Chemistry in the Gas Phase and on Surfaces
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批准号:RGPIN-2014-04966
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项目类别:Discovery Grants Program - Individual
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资助金额:$3.13万
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财政年份:2016
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负责人:Shi, Yujun
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依托单位:
Hot Wire Chemical Vapor Deposition Chemistry in the Gas Phase and on Surfaces
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批准号:RGPIN-2014-04966
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项目类别:Discovery Grants Program - Individual
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资助金额:$3.13万
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财政年份:2015
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负责人:Shi, Yujun
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依托单位:
Hot Wire Chemical Vapor Deposition Chemistry in the Gas Phase and on Surfaces
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批准号:RGPIN-2014-04966
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项目类别:Discovery Grants Program - Individual
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资助金额:$3.13万
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财政年份:2014
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负责人:Shi, Yujun
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依托单位:
A molecular-level investigation of the hot-wire chemical vapor deposition chemistry of si-containing thin films
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批准号:283270-2009
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项目类别:Discovery Grants Program - Individual
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资助金额:$3.64万
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财政年份:2013
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负责人:Shi, Yujun
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依托单位:
A molecular-level investigation of the hot-wire chemical vapor deposition chemistry of si-containing thin films
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批准号:283270-2009
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项目类别:Discovery Grants Program - Individual
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资助金额:$3.64万
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财政年份:2012
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负责人:Shi, Yujun
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依托单位:
A molecular-level investigation of the hot-wire chemical vapor deposition chemistry of si-containing thin films
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批准号:283270-2009
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项目类别:Discovery Grants Program - Individual
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资助金额:$3.64万
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财政年份:2011
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负责人:Shi, Yujun
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依托单位:
A molecular-level investigation of the hot-wire chemical vapor deposition chemistry of si-containing thin films
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批准号:283270-2009
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项目类别:Discovery Grants Program - Individual
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资助金额:$3.64万
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财政年份:2010
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负责人:Shi, Yujun
-
依托单位:
A molecular-level investigation of the hot-wire chemical vapor deposition chemistry of si-containing thin films
-
批准号:283270-2009
-
项目类别:Discovery Grants Program - Individual
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资助金额:$3.64万
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财政年份:2009
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负责人:Shi, Yujun
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依托单位:
Structures, kinetics, and energetics of reactive intermediates in hot-wire chemical vapor deposition of Si-containing films
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批准号:283270-2007
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项目类别:Discovery Grants Program - Individual
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资助金额:$3.06万
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财政年份:2008
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负责人:Shi, Yujun
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依托单位:
Studies of Radical Intermediates in Hot-Wire Chemical Vapor Deposition of Semiconductor Thin Films
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批准号:299455-2004
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项目类别:University Faculty Award
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资助金额:$2.91万
-
财政年份:2008
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负责人:Shi, Yujun
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依托单位:
Structures, kinetics, and energetics of reactive intermediates in hot-wire chemical vapor deposition of Si-containing films
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批准号:283270-2007
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项目类别:Discovery Grants Program - Individual
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资助金额:$3.06万
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财政年份:2007
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负责人:Shi, Yujun
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依托单位:
Studies of radical intermediates in hot wire chemical vapor depoisiton of semiconductor thin films
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批准号:283270-2004
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项目类别:Discovery Grants Program - Individual
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资助金额:$3.06万
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财政年份:2006
-
负责人:Shi, Yujun
-
依托单位:
Studies of radical intermediates in hot wire chemical vapor depoisiton of semiconductor thin films
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批准号:283270-2004
-
项目类别:Discovery Grants Program - Individual
-
资助金额:$3.06万
-
财政年份:2005
-
负责人:Shi, Yujun
-
依托单位:
Studies of Radical Intermediates in Hot-Wire Chemical Vapor Deposition of Semiconductor Thin Films
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批准号:299455-2004
-
项目类别:University Faculty Award
-
资助金额:$2.91万
-
财政年份:2005
-
负责人:Shi, Yujun
-
依托单位:
国内基金
海外基金
前缘激波诱导Radical-Farming燃烧机理的数值研究
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批准号:10702064
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项目类别:青年科学基金项目
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资助金额:21.0万元
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批准年份:2007
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负责人:邹建锋
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依托单位: