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Properties of nanostructures produced by ion implantation

Properties of nanostructures produced by ion implantation
离子注入产生的纳米结构的特性
批准号:
36670-2007
负责人:
Ross, Guy
金额:
$3.63万
依托单位国家:
加拿大
项目类别:
Discovery Grants Program - Individual
财政年份:
2007
资助国家:
加拿大
项目状态:
已结题
起止时间:
2007-01-01 至 2008-12-31

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中文摘要
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英文摘要
THE LONG TERM OBJECTIVE of this proposal is to take advantage of the enormous possibilities of the interaction of ion beams with matter for the development of efficient Si-based light source and of surface treatments which can be used on various materials. The short term and sub-objectives are: 1) Investigation of growth and luminescence properties of silicon nanocrystals (Si-nc), 2) Optimisation of optical gain in Si-nc/SiO2 layers, 3) Fabrication of a Si laser prototype, 4) Study of ion beam matter interaction, especially for isolating materials, 5) Adjustment of the surface/interface properties such as wetting, adherence and work function by formation of nanostructured surfacesPHOTO- AND ELECTRO-LUMINESCENCE OF Si-nc: The development of an all-Si technology will considerable simplify the integration of the optoelectronic devices. The principal milestones are: 1) Validation and optimisation of our computer code used for the simulation of the light interference effect on the PL spectra, 2) Modulation of the PL and EL spectra by light interference and double implantation, 3) Determination of the optical and light emission properties of the Si-nc/SiO2 layer as a function of depth, 4) Specification of the Si-nc/SiO2 layer composition leading to an improvement of the optical gain, 5) Optimisation of the current injection efficiency for EL, 6) Construction of a simple optoelectronic device such as a Si laser prototype.MODIFICATION OF SURFACE PROPERTIES: Many problems related to surface phenomena such as formation and accumulation of fog, ice, dust and dirtiness, require efficient and durable surface treatment. The principal milestones are: 1) Ageing control of superhydrophilic surfaces by double implantation and/or chemical passivation and/or nanostructuration of the surfaces, 2) Production of superhydrophobic nanostructured surfaces, 3) Determination of surface molecular composition that reduces adhesion of ice and dirtiness, 4) Optimisation of the processes leading to the adjustment of the surface work function with nanostructured surfaces, 5) Increase of photovoltaic cell efficiency by using Si-nc and nanostructured surfaces.
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Properties of nanostructures produced by ion implantation
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