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Properties of nanostructures produced by ion implantation

Properties of nanostructures produced by ion implantation
离子注入产生的纳米结构的特性
批准号:
36670-2007
负责人:
Ross, Guy
金额:
$3.63万
依托单位国家:
加拿大
项目类别:
Discovery Grants Program - Individual
财政年份:
2009
资助国家:
加拿大
项目状态:
已结题
起止时间:
2009-01-01 至 2010-12-31

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中文摘要
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英文摘要
THE LONG TERM OBJECTIVE of this proposal is to take advantage of the enormous possibilities of the interaction of ion beams with matter for the development of efficient Si-based light source and of surface treatments which can be used on various materials. The short term and sub-objectives are: 1) Investigation of growth and luminescence properties of silicon nanocrystals (Si-nc), 2) Optimisation of optical gain in Si-nc/SiO2 layers, 3) Fabrication of a Si laser prototype, 4) Study of ion beam matter interaction, especially for isolating materials, 5) Adjustment of the surface/interface properties such as wetting, adherence and work function by formation of nanostructured surfaces
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Improvement of nitrogen uptake on steel and stainless steel during gaseous nitriding
Thermal resistance improvement of germanium fiber Bragg gratings
Relaxation of strained GaN thin films by light ion implantation
Properties of nanostructures produced by ion implantation
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