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A mask aligner system

A mask aligner system
掩模对准系统
批准号:
406689-2011
负责人:
Mansour, Raafat
金额:
$10.88万
依托单位:
依托单位国家:
加拿大
项目类别:
Research Tools and Instruments - Category 1 (<$150,000)
财政年份:
2010
资助国家:
加拿大
项目状态:
已结题
起止时间:
2010-01-01 至 2011-12-31
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中文摘要
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英文摘要
The purpose of this Research Tool and Instruments (RTI) grant proposal is to purchase a mask aligner system for lithography applications in the field of Micro-Electro-Mechanical Systems (MEMS), millimeter-wave, terahertz and optoelectronics. The mask aligner is a key processing tool in any micro-fabrication facility. It will be located in a clean room facility at the University of Waterloo that is dedicated to the fabrication of MEMS and gold-based thin film devices. It will benefit more than 20 faculty members and 50 graduate students at the University of Waterloo who currently use this clean room facility. Some of their current research projects that are relevant to the present proposal are: 1) radio frequency (RF) MEMS, 2) chip scale scanning probe microscopes, 3) micro-fabrication and packaging 4) fabrication of neural micro-electrodes,5) MEMS/NEMS sensors 6) integrated miniature antenna array systems 7) millimeter-wave integrated receiver systems, 8) terahertz biosensors, 9) MEMS optical scanners, 10) micro-mirror devices for genetic microarray reading and tissue imaging.
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