Ion milling delayering
Ion milling delayering
批准号:
411410-2010
负责人:
Charlebois, Serge
金额:
$1.82万
依托单位:
依托单位国家:
加拿大
项目类别:
Engage Grants Program
财政年份:
2010
资助国家:
加拿大
项目状态:
已结题
起止时间:
2010-01-01 至 2011-12-31
关键词:
中文摘要
半导体芯片分层是由Chipworks在以电路设计为中心的许可和法律案件中建立专利侵权的技术证据。Chipworks是一家总部位于渥太华的加拿大公司,是该领域公认的领导者。传统的去除芯片上一层一层材料的方法,如化学-机械抛光或反应离子蚀刻,受到新技术中不断缩小的尺寸和更大的材料多样性的极大挑战。
英文摘要
Semiconductor chip delayering is done by Chipworks to establish technical evidence of patent infringement in licensing and legal cases centred on circuit design. Chipworks is an Ottawa based Canadian company which is the recognised leader in this field. Methods traditionally used remove layer by layer of materials on the chip (delayering), such as chemical-mechanical polishing or reactive ion etching, are greatly challenged by the always reducing sizes and the greater material diversity encountered in new technologies.
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依托单位:
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项目类别:Discovery Grants Program - Individual
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资助金额:$1.89万
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依托单位:
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-
依托单位:
海外基金