Materials systems for engineering optical and fluidic devices fabricated via three-dimensional nanoscale interference lithography
Materials systems for engineering optical and fluidic devices fabricated via three-dimensional nanoscale interference lithography
批准号:
418611-2013
负责人:
Brzezinski, Andrew
金额:
$1.82万
依托单位:
依托单位国家:
加拿大
项目类别:
Discovery Grants Program - Individual
财政年份:
2014
资助国家:
加拿大
项目状态:
已结题
起止时间:
2014-01-01 至 2015-12-31
中文摘要
干涉光刻是一种非常稳健的方法,用于制造具有连续孔网络的无缺陷三维纳米结构。这种多孔纳米结构在光学应用中具有巨大的潜力,因为光与特征纳米尺度强烈相互作用。在流体应用中也存在巨大的潜力,其中形成连续网络的纳米级通道可以具有由材料的选择和通道的精确纳米级尺寸赋予的定制特性。通过使用纳米级结构的光学和流体能力来形成光流体装置,具有进一步的可能性。基本的假设是,由干涉光刻产生的大的无缺陷图案非常适合于工程纳米结构材料,其有效地和紧凑地结合联合收割机光-流体相互作用。该研究计划的近期目标是:1)开发通过光致抗蚀剂的干涉光刻法可靠地创建大规模块状薄膜图案的方法,然后将其反转或填充战略材料; 2)开发使用流体试剂的技术,用于随后叠加在纳米结构多孔材料上的大规模和精细图案化; 3)测量和设计由纳米结构多孔材料内部流动的流体产生的光学信号。快速成型方法将与溶剂浇铸、电沉积和材料的溶胶-凝胶沉积一起使用,以快速评估结构质量、工艺兼容性和材料适用性。最有前途的材料组合将用于制造三维多孔纳米结构。纳米结构内部的材料选择和内部材料分布将被操纵,以便设计光子和流体之间的有利相互作用。这项研究可以提供更经济的太阳能收集,因为太阳光线照射设备的角度可以通过纳米结构内部的流体进行调整,以保持对微小嵌入式光伏电池的关注。进一步的应用可能出现在灵敏、紧凑和廉价的微流体光学传感器中。
英文摘要
Interference lithography is an exceptionally robust method for fabricating defect-free three-dimensional nanostructures with a continuous network of pores. Such porous nanostructures have great potential for optical applications as the light interacts strongly with the characteristic nanoscale dimensions. Great potential also exists in fluidic applications, where the nanoscale channels forming continuous networks can have tailored properties bestowed by both the choice of materials and the exact nanoscale dimensions of the channels. Further possibilities are had by using both the optical and fluidic capabilities of the nanoscale structures to form optofluidic devices. The underlying hypothesis is that the large defect-free patterns created by interference lithography are highly suitable for engineering nanostructured materials that effectively and compactly combine light-fluid interactions. The immediate goals of the research program are: 1) To develop methods to reliably create large-scale bulk films patterned by interference lithography of photoresists, which will then be inverted or infilled with strategic materials; 2) To develop techniques employing fluid reagents for subsequent large-scale and fine-scale patterning superimposed on the nanostructured porous materials; 3) To measure and engineer the optical signals arising from fluid flowing inside the nanostructured porous materials. Rapid prototyping methods will be employed with solvent casting, electrodeposition, and sol-gel deposition of materials to quickly assess structure quality, process compatibility, and material suitability. The most promising combinations of materials will then be employed in fabricating three-dimensional porous nanostructures. The material choices and internal material distribution inside the nanostructures will be manipulated in order to engineer a favourable interaction between photons and the fluid. This research could provide more economical solar energy collection as the angle at which the sun's rays strike the device can be adjusted for by fluids inside the nanostructure, to maintained focus on tiny embedded photovoltaic cells. Further applications could arise in sensitive, compact, and inexpensive microfluidic-optical sensors.
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Materials systems for engineering optical and fluidic devices fabricated via three-dimensional nanoscale interference lithography
-
批准号:418611-2013
-
项目类别:Discovery Grants Program - Individual
-
资助金额:$1.75万
-
财政年份:2017
-
负责人:Brzezinski, Andrew
-
依托单位:
Materials systems for engineering optical and fluidic devices fabricated via three-dimensional nanoscale interference lithography
-
批准号:418611-2013
-
项目类别:Discovery Grants Program - Individual
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资助金额:$1.82万
-
财政年份:2016
-
负责人:Brzezinski, Andrew
-
依托单位:
Materials systems for engineering optical and fluidic devices fabricated via three-dimensional nanoscale interference lithography
-
批准号:418611-2013
-
项目类别:Discovery Grants Program - Individual
-
资助金额:$1.82万
-
财政年份:2015
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负责人:Brzezinski, Andrew
-
依托单位:
Materials systems for engineering optical and fluidic devices fabricated via three-dimensional nanoscale interference lithography
-
批准号:418611-2013
-
项目类别:Discovery Grants Program - Individual
-
资助金额:$1.82万
-
财政年份:2013
-
负责人:Brzezinski, Andrew
-
依托单位:
国内基金
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