Molecular Layer Deposition (MLD) of CapturePhos - A Barrier for Flexible Electronics

这项为期两年的NSERC CRD项目旨在扩大一种新型磷基交联型聚合物--膦-烯聚合物网络“Capturephos”的用途。制造和评估本体聚合物的性能相对简单，但了解这些材料作为基材上超薄、均匀涂层的潜力是完全未知的，需要进行重点研究。新的应用需要一种新的合成方法，即利用聚合物中膦中心捕获氧气的能力。这将使CapturPhos成为一种有效的电子封装材料(通常称为“电子封装”)。由于其强大的交联性和固有的灵活性，CapturPhos是柔性电子产品的优秀屏障材料。为了完全整合，这种聚合物应该从气相中制备出来，并在目标表面组装。研究小组将开展一项活动，以(I)在所得到的聚合物膜中制备针对低蒸气压力和最大交联度的独特的磷化氢，并评估其分子层沉积(MLD)工艺的适用性。这还包括调查商业上的初级膦；(Ii)在MLD工艺中与聚烯烃反应伙伴一起利用这些膦来沉积CapturePhos薄膜(10-100 nm)；(Iii)全面表征沉积的薄膜，以评估厚度、均匀性和P含量；(Iv)通过使用乙烯基羧酸(对于氧化物表面)和乙烯基卡宾(对于金属表面)的表面处理来促进选择性区域沉积；(V)比较平板和选择性区域图案化基板的总体吸氧和透氧性能。这项工作的结果旨在为下一代柔性电子设备(有机发光二极管(OLED)和有机光伏(OPV))开发一种新的阻挡涂层方法。拟议的开发将在索尔维集团内的两个全球业务部门--索尔维特种聚合物和索尔维-赛特克(加拿大赛特克)的支持下进行。

This 2-year NSERC CRD project aims to expand the utility of a new class of phosphorus-based crosslinked polymers, the phosphane-ene polymer network "Capturephos". Making and assessing the properties of the bulk polymer has been relatively straightforward but understanding the potential of these materials as an ultrathin, uniform coating on a substrate is completely unknown and requires a focused investigation. The new application, which requires a new synthesis method, is to use the ability of the phosphine centres in the polymer to capture oxygen. This will make CapturPhos an effective encapsulation material for electronics (typically called the "electronic package"). Due to its robust crosslinked nature and its inherent flexibility, CapturPhos is an excellent barrier material for flexible electronics. To integrate fully, this polymer should be made from the gas phase and assemble at a targeted surface. The research team will embark on a campaign to (i) Prepare unique phosphines targeting low vapour pressure and maximum crosslinking in a resulting polymer film and the assessment of their suitability molecular layer deposition (MLD) processes. This will also include a survey of commercially primary phosphines; (ii) Utilize these phosphines with polyolefin reaction partners in an MLD process to deposit thin films (10-100 nm) of CapturePhos; (iii) Fully characterize the deposited films to assess thickness, uniformity and P content; (iv) to promote selective area deposition with surface treatments using vinyl carboxylic acids (for oxide surfaces) and vinyl carbenes (for metal surfaces) (v) Compare flat and selective-area patterned substrates for their overall O2 uptake and O2 transmission properties. The results from this work aim to develop a new approach to barrier coatings for next generation, flexible electronic devices (Organic light emitting diodes (OLED); Organic photovoltaics (OPV)). The proposed development will be carried out with the support of two global business units within the Solvay Group, Solvay Specialty Polymers and Solvay-Cytec (Cytec Canada).