亚像素动态调制提高数字光刻分辨力的研究

3D微结构元件具有高效率、高精度、高密集、高适用性等卓越的技术性能，在高科技信息技术领域具有重要的科学意义和实用价值，探索高分辨力、低成本的制作技术仍是当前国际前沿挑战课题。本项目瞄准数字光刻技术中分辨力受限的难题展开研究，围绕亚像素动态调制提高数字光刻分辨力机理这一核心问题，揭示亚像素动态调制曝光剂量与3D微结构浮雕之间的复杂映射规律，力图构建亚像素动态扫描调制数字光刻模型和亚像素动态分割调制数字光刻模型，探索亚像素动态调制精细成型曲面3D微结构的新方法。本项目的研究成果将极大拓展数字光刻技术的适用范围，促进3D微结构的产业化生产，对推动微光学技术及微纳光机电技术的发展具有重要意义。

3D Microstructure element possesses important scientific significance and use value in the field of high-tech information technology due to its outstanding advantages such as high-efficiency, high precision, high density and good universality. High-resolution and low-cost fabrication technology for 3D microstructure is still a frontier challenge project globally.Our project aims at the hard problem of resolution limit in the digital lithography. Centering on the resolution enhancement mechanism based on sub-pixel dynamic modulation, the complex mapping rule between exposure obtained by sub-pixel dynamic modulation and 3D microstructure relief will be revealed. We will attempt to reconstruct the digital lithography models based on sub-pixel dynamic scanning modulation and sub-pixel dynamic dividing modulation. Furthermore, this project will explore the precise fabrication method of 3D curved microstructure by using sub-pixel dynamic modulation. Research results will greatly expand the application of digital lithography, and promote the industrial production of 3D microstructure. It has important significance for the development of microoptics and Micro/Nano-Opto-Electro-Mechanical technology.