基于样品旋转的导模干涉亚波长结构刻写研究

亚波长结构广泛应用于微纳光学的各个领域，其刻写制备是研究人员关注的重点。本项目中，申请人拟基于样品旋转，通过激发非对称金属包覆介质波导结构中的导模干涉场曝光光刻胶，从理论上实现各种亚波长结构的刻写。通过理论分析、旋转矩阵和数值模拟，研究样品旋转特定角度条件下，导模干涉多次曝光刻写亚波长点阵结构的形状和尺寸、排列方式和周期与旋转角度、光刻胶厚度、曝光所用导模间的关系；研究样品连续旋转曝光条件下，导模干涉刻写亚波长圆光栅的周期、占空比、环带宽度、层数与光刻胶厚度和刻写导模之间的关系。揭示基于样品旋转，导模干涉刻写各种亚波长结构的物理机理，从理论上发展一种成本低廉、操作简单、大面积刻写的亚波长光刻技术。

Subwavelength structures have found numerous applications in different fields of micro-nano optics, and fabrication technologies of the subwavelength scale arouse widespread attention in researchers. The applicant in this project intends to fabricate various subwavelength structures theoretically based on sample rotation by exciting the interference fields of the waveguide modes in an asymmetric metal-cladding dielectric waveguide structure to expose the resist. Using theoretical investigation, rotation matrix, and numerical simulation, the relationships between the shape and size, arrangement, and period of subwavelength structures fabricated by multi-exposure of waveguide modes interference lithography will be studied along with the rotation angle, resist thickness, and the employed waveguide modes under the condition of rotation of the sample by a specific angle. The relationships between the period, duty cycle, annular belt width, the number of layers of the subwavelength circle grating fabricated by waveguide modes interference lithography, resist thickness, and the employed waveguide modes will be investigated under the condition of continuous rotation and exposure of the sample. This project aims to reveal the physical mechanism of fabrication of subwavelength structures by waveguide modes interference lithography based on sample rotation, and to theoretically develop a subwavelength lithography technology that has advantages of low cost, simple operation, and large area fabrication.