基于散射场层析广义椭偏仪的三维纳米结构测量理论与方法

提出研制一种称为散射场层析广义椭偏仪的新型光学仪器，以传统椭偏仪为基础，引入高数值孔径显微物镜并实现照明光束在物镜后焦面的快速扫描层析，获取多入射角下样品的完整散射场分布，且每一处分布都包含一个4×4阶的Mueller矩阵，从而可以获得极为丰富的测量信息。本项目以此为出发点，提出利用散射场层析广义椭偏仪，实现复杂三维纳米结构形貌的快速、低成本、非破坏、精确测量。提出开展纳米结构光学散射场建模与测量机理、三维形貌重构与测量不确定度评估、仪器实现关键技术与原理样机研制、以及纳米结构三维形貌测量应用实验等研究工作。着重解决纳米结构光学散射场快速准确建模求解、三维形貌快速鲁棒重构、仪器系统标定与误差补偿等基础理论和技术难题，研制一套具有自主知识产权的散射场层析广义椭偏仪原理样机，以促进传统光学测量技术在纳米制造领域中的扩展应用，为批量化纳米制造中的在线测量提供新原理、新途径和新工具。

A novel optical instrument named generalized ellipsometer with scatterfield tomography (GEST) is proposed. Based on the conventional ellipsometry and by introducing a high numerical-aperture microscopic lens with its back focal plane rapidly scanned by an illumination beam, GEST can obtain the scatterfield distrubtution of a sample at multiple illumination incidence angles, with each scatterfield point represented by a 4×4 Mueller matrix. Therefore, GEST can provide much more useful information about the sample. Accordingly, in this project, we propose to utilize GEST to realize a fast, low-cost, nondestructive, and accurate measurement of complex three-dimensional nanostructure profiles. We will focus on the investigations including the scatterfield modeling of nanostructures and the GEST-based measurement mechanism, the profile reconstruction and the uncertainty estimation, the key techniques and prototype development of the instrument, and the experiment on nanostructure profile measurements. We will emphasize on the fundamental theories and key techniques in the optical scatterfield modeling of nanostructures, the robust profile reconstruction, and the system calibration and error compensation in instrumentation, and develop a GEST prototype instrument. It is expected that the exploratory research in this project will expand the application of conventional optical metrology in nanomanufacturing, and provide a novel principle and a new means for the in-line measurement in high-volume nanomanufacturing.