Establishment of an Electron Beam Lithography Facility

电子束写入能力变得越来越重要 用于广泛领域的研究。 因为这样的电子束 可以聚焦到很小的尺寸，他们能够画线， 其宽度是光的波长的一部分; 小于0.00001厘米 对于工程应用，例如 宽度在光学器件和全息设计中是重要的， 随着该领域的进一步发展，这种情况变得越来越严重。 这种电子束 书写机器也在电子和 微波器件和系统设计。 目前建议的努力是购买这样一台机器， 作为一个共享的设施，应用于工程研究， 新兴技术。

Electron beam writing capabilities are becoming increasingly important for research in a wide variety of fields. Because such electron beams can be focussed to small dimensions, they are capable of drawing lines which have widths which are a fraction of the wavelength of light; that is less than .00001 centimeters. For engineering applications, such widths are important in optical device and holographic design and will become increasingly so as the field develops further. Such e-beam writing machines are also seeing increased use in electronic and microwave device and systems design. The present proposed effort is for the purchase of such a machine, to be used as a shared facility, for applications to engineering research in emerging technologies.