Engineering Research Equiment Grant: Sputter Deposition System for Optical Devices and Materials Studies

光波技术领域的发展关键取决于适当类型的薄膜、多层结构和器件的生长、表征和发展。各种类型的设备可用于该领域，其中最通用和最经济的是所谓的溅射沉积系统。在这个过程中，一个离子束或电子束撞击待沉积材料的目标。然后，材料被电场驱动到将要发生沉积的基底上。这一基本原则可以根据具体需要以各种方式加以修改；例如，可以进行沉积、清洗或蚀刻。本系统拟用于光信号处理领域的研究。

The development of the field of lightwave technology depends crucially upon the growth, characterization, and development of appropriate types of films, multi-layered structures, and devices. Various types of equipment are available for use in this area, one of the most versatile and economical is the so-called sputter deposition system. In this an ion or electron beam strikes a target of the material to be deposited. The material is then driven by electric fields to the substrate on which the deposition is to occur. This basic principle can be modified in a variety of ways depending upon the particular need; for instance, deposition, cleaning or etching can be done. The system proposed for purchase here is intended for use in the area of optical signal processing research.