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Support of the 1990 Gordon Conference on Organic Thin Films;February 12-16, 1990; Los Angeles, CA

Support of the 1990 Gordon Conference on Organic Thin Films;February 12-16, 1990; Los Angeles, CA
支持 1990 年戈登有机薄膜会议;1990 年 2 月 12-16 日;
批准号:
8915109
负责人:
Alexander Cruickshank
金额:
$1.5万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1990
资助国家:
美国
项目状态:
已结题
起止时间:
1990-02-01 至 1990-07-31

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项目成果

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中文摘要
翻译
该奖项为1990年2月举行的戈登有机薄膜会议提供了部分支持。会议主席是华盛顿海军研究实验室的Joel M. Schnur。会议将从分子的角度关注有机薄膜的基本方面。研究了薄膜的分子结构与薄膜的润湿性、粘附性和润滑性等宏观性能之间的关系。将探索分子工程薄膜的潜在应用能力。应用主题包括生物传感器制造,亚微米微光刻电阻的进展,以及非线性光学薄膜。最新的技术,如原子力显微镜和离子电导显微镜,将在有机薄膜研究的背景下进行检查。这次会议将汇集化学、材料和电子工程师、生物学家、物理学家和化学家。本次会议间接支持化学和热系统的材料化学和化学加工倡议的主要推力。预计约有125名与会者。NSF的支持使年轻的研究者,如研究生,以及资源不足的教师能够参与。代表性不足的群体也将成为支持的对象。将邀请来自日本和西欧的三位国际专家参加。
英文摘要
This award provides partial support for the February 1990 Gordon Conference on organic thin films. The chairperson is Joel M. Schnur of the Naval Research Laboratories in Washington, D.C. The conference will focus on the fundamental aspects of organic thin films from a molecular point of view. The relationship between the molecular structure of the films and the macroscopic properties exhibited by them such as wetting, adhesion, and lubrication will be examined. The ability to molecularly engineer films for potential applications will be explored. Application topics include biosensor fabrication, advances in sub-micron microlithographic resists, and non-linear optical thin films. State of the art techniques such as atomic force and ion conductance microscopies will be examined in the context of their utility for the study of organic thin films. The conference will bring together chemical, material, and electronic engineers, biologists, physicists, and chemists. This conference indirectly supports the major thrust of the Chemical and Thermal System's Material Chemistry and Chemical Processing initiative. Approximately 125 attendees are expected. The NSF support enables participation of young investigators, such as graduate students, as well as faculty with inadequate resources to attend. Under-represented groups will also be targeted for support. Three international experts will be invited to participate from Japan and Western Europe.
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