Chemical Control of Materials Synthesis Through Molecular Precursor Design

该奖项在无机，生物无机和有机化学 该计划支持物理学大卫V.巴克斯特博士的工作 部门，和博士肯尼斯G。作者声明：by J. 奇泽姆，化学系，印第安纳州大学。 他们将 开发用于化学气相沉积（CVD）薄 碳化钨、前过渡金属氮化物的膜，以及 一些金属氧化物和碳化物。 金属氧化物、氮化物和 碳化物将由金属醇盐、酰胺和 有机金属，分别。 专门用于研究 是钡醇盐，其取代基将被改性， 测试“空间压力”对薄膜性能的影响; 铊、钡和钙的氟代烷氧化物;金属 Mo、W、Al和碱金属的醇盐;以及混合醇盐 含有钠和钨或钾和锆。 重点将放在优化波动性和 前体的水解不敏感性， 前驱体固态化机理 材料，并研究前体设计在 最终产品的性能。 %%% 新型电子材料的发展依赖于 能够控制材料的成分、纯度 以及其有效和经济的沉积。 本研究 在沉积之前起始材料的影响将是 调查了各种材料，以及 沉积机制。 重点将放在 化学合成和改性新的前体， 以生产高质量的薄膜。

This award in the Inorganic, Bioinorganic, and Organometallic Program supports the work of Dr. David V. Baxter, Physics Department, and Drs. Kenneth G. Caulton and Malcolm H. Chisholm, Chemistry Department, Indiana University. They will develop precursors for chemical vapor deposition (CVD) of thin films of tungsten carbide, early transition metal nitrides, and some metal oxides and carbides. Metal oxides, nitrides, and carbides will be formed from metal alkoxides, amides, and organometallics, respectively. Specifically targeted for study are the barium alkoxides, whose substituents will be modifed to test the "steric pressure" on thin film properties; fluoroalkoxides of thallium, barium and calcium; metal alkoxides of Mo, W, Al, and alkali metals; and mixed alkoxides containing sodium and tungsten or potassium and zirconium. Emphasis will be placed on optimizing the volatility and hydrolytic insensitivity of precursors, continuing studies of the mechanism of transformation of precursors into solid state materials, and studying the role of precursor design in the properties of the final product. %%% The development of new electronic materials depends on the ability to control the composition of the material, its purity, and its effective and economic deposition. In this study, the influence of the starting material prior to deposition will be investigated for a variety of materials, as well as the mechanism of deposition. Emphasis will be placed on the chemical synthesis and modification of new precursors in order to produce high quality thin films.