Electronic Transport in Amorphous and Multilayered Metallic Thin Films

本研究项目致力于研究非晶态和多层金属合金的物理性质。将采用的实验技术是电阻率测量，特别是低温磁电阻率测量和X射线衍射。所研究的样品将是磁控溅射制备的薄膜。研究的目的是：1)检验无序导体中电子运动的现有理论；2)研究成分调制金属薄膜的电子输运性质；3)增加对固体中电子散射过程的一般理解。

This research project is devoted to the study of the physical properties of amorphous and multilayered metallic alloys. The experimental techniques to be employed are resistivity measurements, especially low-temperature magneto-resistivity, and X-ray diffraction. The samples to be studied will be thin films prepared by magnetron sputtering. The research objectives are: 1) to test current theories of electron motion in disordered conductors; 2) to investigate the electron transport properties of compositionally modulated thin metallic films; 3) to increase the general understanding of electron scattering processes in solids.