Electronic Transport in Amorphous and Multilayered Metallic Thin Films

非晶和多层金属薄膜中的电子传输

• 批准号: 8918139
• 负责人: David Baxter
• 金额: $ 15.8万
• 依托单位: Indiana University
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1990
• 资助国家: 美国
• 起止时间: 1990-08-01 至 1994-01-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=8918139&HistoricalAwards=false
• 关键词: Electronic; Transport; Amorphous; Multilayered; Metallic

This research project is devoted to the study of the physical properties of amorphous and multilayered metallic alloys. The experimental techniques to be employed are resistivity measurements, especially low-temperature magneto-resistivity, and X-ray diffraction. The samples to be studied will be thin films prepared by magnetron sputtering. The research objectives are: 1) to test current theories of electron motion in disordered conductors; 2) to investigate the electron transport properties of compositionally modulated thin metallic films; 3) to increase the general understanding of electron scattering processes in solids.

本研究项目致力于研究非晶态和多层金属合金的物理性质。将采用的实验技术是电阻率测量，特别是低温磁电阻率测量和X射线衍射。所研究的样品将是磁控溅射制备的薄膜。研究的目的是：1)检验无序导体中电子运动的现有理论；2)研究成分调制金属薄膜的电子输运性质；3)增加对固体中电子散射过程的一般理解。