Electronic Transport in Amorphous and Multilayered Metallic Thin Films

这个研究项目致力于研究 非晶态和多层金属合金的性能。 的 采用的实验技术是电阻率 测量，特别是低温磁电阻率，以及 x射线衍射 待研究的样品将是薄膜 通过磁控溅射制备。 研究目标是： 1)来检验目前关于电子在无序宇宙中运动的理论 导体; 2）研究电子输运性质 成分调制的薄金属膜; 3）增加 电子散射过程的一般理解， 固体

This research project is devoted to the study of the physical properties of amorphous and multilayered metallic alloys. The experimental techniques to be employed are resistivity measurements, especially low-temperature magneto-resistivity, and X-ray diffraction. The samples to be studied will be thin films prepared by magnetron sputtering. The research objectives are: 1) to test current theories of electron motion in disordered conductors; 2) to investigate the electron transport properties of compositionally modulated thin metallic films; 3) to increase the general understanding of electron scattering processes in solids.