Conference: Support of the 35th International Symposium on Electron, Ion and Photon Beams, Seattle, Washington, May 28-31, 1991

该提案是为了支持学生前往 第35届国际电子、离子和 5月28日至31日，在华盛顿的西雅图， 1991. 研讨会将涵盖最新的研究 结果在纳米纤维领域， 微加工，电子和离子光刻，x- 射线光刻、粒子束光学和前沿 纳米纤维的应用 在这次大会的重要 来自世界各地的最新研究 通常会先报告。 的议事情况 会议将发表在《日刊》上。 真空科学与技术

This proposal is for support of student travel to the 35th International Symposium on Electron, Ion and Photon Beams, in Seattle, Washington, May 28-31, 1991. The symposium will cover the latest research results in the fields of nanofabrication, microfabrication, electron and ion lithographies, x- ray lithography, particle beam optics, and forefront applications of nanofabrication. At this conference the latest research from groups around the world are usually reported first. The proceedings of the conference will be published in the Journal of Vacuum Science and Technology.