High Temperature Superconducting Coatings on Non-Planar Surface

金属有机化学气相沉积（MOCVD） 温度超导材料已被证明是 可行的，并且迄今为止沉积在平坦基底上的膜具有 电性能与最佳报道结果相当。 然而，为了利用MOCVD来涂覆奇怪的形状，例如 RF腔的内部需要创新的技术。 这 是一个测试这种技术可行性的建议， 使用MOCVD来制造沉积的籽晶层 缓慢地，一次一个原子层，在非平面衬底上。 然后可以以高速率沉积膜的主体， 应该产生高质量氧化钇-钡-铜薄膜 具有优异的晶体取向和表面质量。 作为 测试文章的实际意义，我们建议涂层 在中空圆柱形RF腔内。 射频 沉积在平坦表面上的膜的表征将 在第一阶段进行。

Metalorganic chemical vapor deposition (MOCVD) of high temperature superconducting materials has been shown to be feasible, and films deposited to date on flat substrates have electrical properties comparable to the best reported results. However, to take advantage of MOCVD to coat odd shapes, such as the inside of rf cavities, requires innovative techniques. This is a proposal to test the feasibility of one such technique, using MOCVD for production of a seed crystal layer deposited slowly, one atomic layer at a time, on a non-planar substrate. The bulk of the film can then be deposited at high rates, which should produce high quality yttrium-barium-copper-oxide films with excellent crystal orientation and surface quality. As a test article of practical importance, we propose to coat the inside of a hollow cylindrical rf cavity. Radio frequency characterization of the film deposited on a flat surface will be performed in Phase I.