Novel Toroidal Electron Cyclotron Resonance Reactor for Semiconductor Materials Processing

一个新电子的研究计划 回旋共振反应堆 提出了干法蚀刻和沉积。 环形ECR反应器（TECR）使用 独特的磁性几何结构， 巨大的潜在利益;（1）巨大的 减少晶片暴露于高- 能量光子辐射和相关 晶片加热，（2）蚀刻的均匀性 超过8英寸的晶圆，同时保持 蚀刻速率可与 常规ECR源（按顺序 1微米/分钟。(3)的能力 将离子成分与 中性成分的冲击， 晶片，以及（4）非常定向的离子 减少模式依赖性的通量 在亚微米特征的蚀刻中。 该设计允许分离的 通过使用从晶片的辉光放电 磁场线来引导 将电子和离子传输到 晶圆 蚀刻均匀性 晶片可以通过修整 螺线管磁场，因此， 可以独立控制， 工艺化学和排放 动力学 在第一阶段，基础物理学 反应堆将被建模， 设计原型反应堆， 制作的工程图纸。

A research program for a novel electron cyclotron resonance (ECR) reactor for dry etching and deposition is proposed. The toroidal ECR reactor (TECR) uses a unique magnetic geometry which offers great potential benefits; (1) greatly reduced exposure of the wafer to high- energy photon radiation and associated wafer heating, (2) uniformity of etching over 8-inch wafers while maintaining etching rates which are comparable to conventional ECR sources (on the order of 1 micron/minute. (3) the ability to separate the ion composition from that of the neutral composition striking the wafer, and (4) very directional ion fluxes that reduce pattern dependencies in the etching of submicron features. The design permits the separation of the glow discharge from the wafer by using magnetic field lines to guide the transport of electrons and ions to the wafer. The etching uniformity across the wafer can be adjusted by trimming the solenoidal magnetic field, and thus, can be controlled independently of the process chemistry and discharge kinetics. In Phase I, the basic physics of the reactor will be modelled, a prototype reactor be designed and engineering drawings produced.