Chemical Vapor Deposition from the Metal Hexacarbonyls

该奖项是在化学部门的先进材料和加工项目下颁发的，以支持Singmaster-Hernandez博士的研究。该研究将提供微观化学过程的理解，导致激光辅助和热裂解金属薄膜沉积的族六羰基。薄膜的组成和形态将通过扫描俄歇光谱进行探测。化学气相沉积过程将与反应中间体的低温基质分离相结合。利用傅里叶变换红外光谱和紫外可见光谱对基质分离物进行鉴定。这两项研究将相互补充，并为膜沉积、杂质结合的机制提供额外的见解，并为去除或防止膜杂质的方法提供可能的见解。对金属薄膜沉积机理和所涉及的中间体的基本认识对微电子工业有很大的价值。

This award is made under the Advanced Materials and Processing Program in the Chemistry Division in support of the research of Dr. Singmaster-Hernandez. The research will provide an understanding of the microscopic chemical processes leading to both laser-assisted and pyrolytic thin metal film deposition from the Group VI hexacarbonyls. Film composition and morphology will be probed by Scanning Auger Spectroscopy. The chemical vapor deposition process will be coupled with cryogenic matrix isolation of the reactive intermediates. Matrix isolated species will be identified by Fourier Transform Infrared and UV-Visible spectroscopies. Both studies will complement each other and provide additional insight into the mechanisms of film deposition, incorporation of impurities, and possible insights into ways that film impurities can be removed or prevented. %%% A fundamental understanding of the mechanism of thin metal film deposition and the intermediates involved will be of great value to the microelectronics industry.