Plasma-enhanced chemical vapor deposition tool

在微波技术与光子学研究所的洁净室里，成功地生产了几十年的半导体样品和微波组件。洁净室区域(黄光区、湿化学、电镀)于2021年进行改造并重新投入运营。现在，一些技术系统将被更新。在本应用范围内，应购买等离子体激活化学气相沉积(PECVD)工具，用于沉积各种介质，特别是氮化硅(SiN)、碳化硅(SIC)和氧化硅(SiO)，可能还包括混合物以及非晶硅。各层的张力应该是可调的，这就需要一个带有电感耦合等离子体(ICP)和射频发生器的系统。背景：达姆施塔特理工大学微波技术与光子学研究所(IMP)的净化室目前拥有一台已有近18年历史的等离子沉积系统。由于其老化、定期需要维修以及没有备件，应购买更换装置。对旧设备进行升级或现代化是不划算的。PECVD系统是洁净室技术的核心要素，是大多数加工顺序所必需的，因此大量项目依赖于该系统的功能。例如，使用该系统沉积减反射涂层(光学和光子组件)，生长绝缘体(光子和电子组件)，制造微机械可调反射镜(微机械)，以及将低导热系数的层用作温度调节元件的一部分。此外，该系统还可以沉积用于半导体材料刻蚀的硬掩模。该系统的主要负责人将是主要申请人萨沙·普鲁。净化室和PECVD由电气工程和信息技术部的几个部门(FG)联合运营和使用，这些部门是FG微波技术(Jakoby)、FG太赫兹元器件和太赫兹系统(PREU)以及FG电子新材料(Meinert)。这项技术也得到了FG集成微纳系统(BURG)的支持和共享。明确要求在电气工程部门以外的地方共享使用。共同申请者Bernhard Urbaszek(混合量子系统物理系，自2022年9月以来)就是第一个这样的例子。

In the clean room of the Institute of Microwave Technology and Photonics, semiconductor samples and microwave components have been successfully produced for several decades. The cleanroom area (yellow light area, wet chemistry, electroplating) was renovated and put back into operation in 2021. Now some technology systems are to be brought up to date. Within the scope of this application, a plasma-activated chemical vapor deposition (PECVD) tool for the deposition of various dielectrics, especially silicon nitride (SiN), silicon carbide (SiC) and silicon oxide (SiO), possibly also mixtures, as well as amorphous silicon shall be purchased. The tension of the layers should be adjustable, which requires a system with ICP (inductively coupled plasma) and RF generator. Background: The clean room of the Institute of Microwave Technology and Photonics (IMP) at TU Darmstadt currently has an approximately 18-year-old plasma deposition system. Due to its age, regularly necessary repairs and the unavailability of spare parts, a replacement device shall be purchased. An upgrade or modernization of the old equipment is uneconomical. The PECVD system is a core element of cleanroom technology and is required for most processing sequences, so that a large number of projects depend on the functionality of the system. For example, anti-reflection coatings are deposited with the system (optical and photonic components), insulators are grown (photonic and electronic components), micromechanically adjustable mirrors are manufactured (micromechanics), and layers with low heat conduction are used as part of temperature-regulating elements. Furthermore, hard masks for etching of semiconductor materials can be deposited with the system. The main person in charge for the system will be the main applicant, Sascha Preu. The cleanroom and including the PECVD is jointly operated and used by several departments (FG) of the Department of Electrical Engineering and Information Technology, namely FG Microwave Technology (Jakoby), FG Terahertz Components and Terahertz Systems (Preu) as well as the FG New Materials for Electronics (Meinert). The technology is also supported and shared by the FG Integrated Micro-Nanosystems (Burg). Shared use outside of electrical engineering department is explicitly desired. Co-applicant Bernhard Urbaszek (Hybrid Quantum Systems, Department of Physics, since September 2022) is a first example of this.