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Engineering Research Equipment: Equipment for High Lateral Resolution Lithography

Engineering Research Equipment: Equipment for High Lateral Resolution Lithography
工程研究设备: 高横向分辨率光刻设备
批准号:
9500019
负责人:
David Trumper
金额:
$8.6万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1995
资助国家:
美国
项目状态:
已结题
起止时间:
1995-04-15 至 1997-09-30

项目摘要

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中文摘要
翻译
小行星9500019 该工程研究设备奖将用于建立一个独特的高横向分辨率定位系统:在25 mm x 25 mm x 100微米的空间内具有1.0 nm的可重复性。 该系统构成了所谓的远程扫描平台(LORS)的基础,LORS是用于制造集成电路、光掩模和微机械致动器的下一代设备的关键部件。 该奖项资助的基本组件是扫描探针显微镜,包括系统控制器和扫描透射或原子力显微镜的样品台,激光干涉测量系统以及高速数据采集和数字信号处理系统。 该设计基于研究者在混合油/磁轴承方面的专业知识,该轴承实现了0.4 nm峰到峰的机械噪声水平。 这种精密机械定位装置是一种新概念,它将成为生产高价值精密或微机械产品所需的新型超精密制造设备和集成电路光掩模的基础。 ***
英文摘要
9500019 Trumper This engineering research equipment award will be used to build a unique high lateral resolution positioning system: 1.0 nm repeatability in a 25mm x 25 mm x 100 micrometer space. This system forms the basis for what is termed the long-range scanning stage (LORS), a critical component in the next generation of equipment used to manufacture integrated circuits, photo-masks, and micromechanical actuators. The basic components funded by this award are a scanned probe microscope comprised of a system controller and a sample stage for scanning transmission or atomic force microscopy, a laser interferometry system, and a high speed data acquisition and digital signal processing system. The design is based on the investigator's expertise in hybrid oil/magnetic bearings that achieve a mechanical noise level of 0.4 nm peak-to-peak. This precision mechanical positioning device is a new concept, that will form the basis for new types of ultra precision manufacturing equipment needed to produce high value precision or micromechanical products, and photo-masks for integrated circuits. ***
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国内基金
海外基金
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  • 批准号:
    24ZR1403900
  • 项目类别:
    省市级项目
  • 资助金额:
    --
  • 批准年份:
    2024
  • 负责人:
    SATOSHI NAWATA
  • 依托单位:
Cell Research
Cell Research
Cell Research (细胞研究)