CAREER: Ion Beam Assisted Deposition of Magnetoresistive Films

这个CAREER研究计划的目的是确定离子束轰击对蒸发坡莫合金-氮-铁薄膜的磁和电性能的影响。的电，磁阻和磁性能的膜测量作为离子种类，通量和能量，衬底温度，和沉积后退火处理的函数。 薄膜的微观结构的特点和相关的电和磁性能。 该研究是与IBM Almaden研究中心的合作项目。 教育目标包括电子，光学和磁性材料的课程和课程开发，以及本科生和研究生的研究监督，咨询和教育推广。 课程开发工作的重点是电子和材料工程专业的学生在电子材料加工在一个基于团队的，开放式的设计实验室设置的跨学科课程序列。在电子束蒸发坡莫合金薄膜的过程中，用离子束轰击来改善磁盘驱动器中磁阻读头所用薄膜的磁阻响应。 ;

The objective of this CAREER research program is to determine the effects of ion beam bombardment on the magnetic and electrical properties of evaporated Permalloy-nitrogen-iron thin films. The electrical, magnetoresistive and magnetic properties of the films are measured as a function of ion species, flux and energy, substrate temperature, and post-deposition annealing treatment. The microstructure of the films is characterized and correlated to the electrical and magnetic properties. This research is a collaborative project with IBM Almaden Research Center. The educational objectives include course and curriculum development in electronic, optical and magnetic materials, as well as undergraduate and graduate research supervision, advising, and educational outreach. The curriculum development efforts are focused on an interdisciplinary course sequence for electrical and materials engineering students in electronic materials processing in a team-based, open-ended design laboratory setting. %%% Ion beam bombardment during electron beam evaporation of Permalloy films is used to imp rove the magnetoresistive response of films used in magnetoresistive read heads in magnetic disk drives. ;