Study of Growth Front Roughening Using Diffraction and Imaging Techniques

w：\awards\awards96\*.doc 9531482 Wang 这项研究将支持在远离平衡的条件下生长/蚀刻表面过程中形成的界面粗糙度的调查。界面粗糙度是薄膜沉积中的一个核心问题，直接控制着薄膜的许多物理和化学性质。目标是生长非晶薄膜，并明确测试各种建议的有效性。 基于噪声诱导的机制 增长 正面粗糙化。 在分子束外延（MBE）生长前沿的各种粗糙度机制的分化将进行， 真实的时间衍射技术的发展，特别是在恶劣的沉积环境中用于粗糙表面生长的定量测量的光散射。 这项研究将支持调查的界面粗糙度的形成过程中的生长/蚀刻的表面条件下远离平衡。界面粗糙度是薄膜沉积中的一个核心问题，直接控制着薄膜的许多物理和化学性质。目标是生长非晶薄膜，并明确测试各种建议的有效性。 基于噪声诱导的机制 增长 正面粗糙化。 将使用各种生长技术，并将开发用于原位监测粗糙表面生长的光散射技术。 ***

w:\awards\awards96\*.doc 9531482 Wang This research will support the investigation of the formation of interface roughness during growth/etching of surfaces under conditions far from equilibrium. Interface roughness is a central issue in thin film deposition and directly controls many physical and chemical properties of the films. The goals are to grow amorphous films and test unambiguously the validity of various proposed mechanisms based on noise induced growth front roughening. Differentiation of various roughness mechanisms in a molecular beam epitaxy (MBE) growth front will be carried out as will the development of real time diffraction techniques, especially light scattering for quantitative measurement of rough surface growth in a hostile deposition environment. %%% This research will support the investigation of the formation of interface roughness during growth/etching of surfaces under conditions far from equilibrium. Interface roughness is a central issue in thin film deposition and directly controls many physical and chemical properties of the films. The goals are to grow amorphous films and test unambiguously the validity of various proposed mechanisms based on noise induced growth front roughening. Various growth techniques will be used and a light scattering technique for the in situ monitoring of rough surface growth will be developed. ***