Pulsed Laser Ablation for Manufacturing: A Novel Dual-LaserFilm Growth Process

慕克吉9622114电子和光学薄膜的生产目前依赖于分子束外延、化学气相沉积、溅射、液相外延、离子束沉积和热蒸发等技术。研究了CO2激光与靶材的相互作用以及时间整形的脉冲间延迟对CO2激光能量与准分子激光烧蚀羽流耦合的影响。理论模型和实验模型都将被用来优化工艺参数。为了评估双激光工艺作为一种制造方法的灵活性，将研究三种不同的材料，包括铌酸锂、高温超导和非晶态稀土过渡金属合金。这一研究项目的成果将使这项技术的普遍适用性数据库得以开发，从而实现脉冲激光沉积(PLD)用于制造。研究结果将为开发结合了分子外延技术和单源沉积技术优点的新型制造技术提供有用的工具和模型

Mukherjee 9622114 Electronic and optical thin film production currently relies on techniques such as molecular beam epitaxy (MBE), chemical vapor deposition, sputtering, liquid phase epitaxy, ion beam deposition, and thermal evaporation. The research is to study the interaction of the CO2 laser with the target as well as the effect of inter-pluse delay of the temporal shaping on the coupling of the CO2 laser energy to the excimer laser-ablated plume. Both theorical and experimental models will be studied to optimize the process parameters. To assess the flexibility of the proposed dual-laser process as a manufacturing method, three diferent materials, including Lithium Niobate, High Temperature Superconductor, and Amorphous rare earth-transition metal alloys will be investigated. The outcome of this research project would allow the development of a database for the general applicability of this technique, thus the realization of the use of pulsed laser deposition (PLD) for manufacturing could be achieved. The outcomes of the study would yield useful tools and models to develop a novel manufacturing technique which combine the merits of molecular epitaxy technology and single source deposition