Research Initiation: Plasma-Assisted Pulsed Laser Deposition of High Temperature Superconducting Thin Films; Novel Optical Plume Diagnostics

该项目将研究等离子体辅助激光沉积过程中的物理原理，以在衬底上原位生长高临界温度超导薄膜。对这一过程的物理机制的了解对于在低温衬底上沉积可重复的薄膜以及随后集成到现有的半导体技术中至关重要。沉积过程的成功建模和控制可能使超导薄膜的制造具有一致的性能，这是制造具有实际用途的器件所需的。

The project will investigate the physical principle underlying the plasma-assisted laser deposition process for the in situ growth of high critical temperature superconducting thin films on a substrate. An understanding of the physical mechanisms governing the process are critical for reproducible thin film deposition on a low temperature substrate and subsequent integration into existing semiconductor technologies. The successful modeling and control of the deposition process may allow the manufacture of superconducting thin films with the consistent properties that are needed to produce devices that are of practical usefulness.