In-situ Fabrication of Diamond Structures for Microelectromechanical Systems (MEMS) Using a Novel Pulsed Laser Process
使用新型脉冲激光工艺原位制造微机电系统 (MEMS) 金刚石结构
基本信息
- 批准号:9978738
- 负责人:
- 金额:$ 33.5万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Continuing Grant
- 财政年份:1999
- 资助国家:美国
- 起止时间:1999-09-01 至 2003-08-31
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
While recent advances in the micro-fabrication of materials for the integrated circuits and microelectromechanical systems primarily rely on combinations of lithographic techniques and physical or chemical etching, these material removal processes are not very useful for the micro-fabrication of features in hard coating such as diamond. This project investigates a novel method for the in-situ fabrication of a large variety of diamond microstructures ranging from the sub-micron to the sub-millimeter dimension by a pulsed dual-laser ablation process with a pulsed CO2 laser generated transient thermal micro-patterning process. The growth of both freestanding diamond meso-structures as well as desired microstructures of diamond on silicon substrates will be studied. The process will provide a versatile microfabrication tool for diamond that may be extended to other hard, tribological materials. The experimental study includes the determination of the relationship between energy, excitation and degree of ionization in the laser-ablated plume and the interaction with the substrate. A theoretical model of the dynamics of the transient laser-induced thermal profiles on the substrate will be developed to predict possible feature sizes based upon the experimental findings. The project provides exciting opportunities for graduate and undergraduate students to gain experience in laser physics, materials science and thermal modeling.
虽然用于集成电路和微机电系统的材料的微制造的最新进展主要依赖于光刻技术和物理或化学蚀刻的组合,但是这些材料去除工艺对于诸如金刚石的硬涂层中的特征的微制造不是非常有用。 本项目研究了一种新的方法,通过脉冲双激光烧蚀工艺与脉冲CO2激光产生的瞬态热微图案化工艺,原位制造各种金刚石微结构,从亚微米到亚毫米尺寸。 我们将研究在硅衬底上生长独立的金刚石介观结构以及所需的金刚石微结构。该工艺将为金刚石提供一种多功能的微加工工具,可以扩展到其他坚硬的摩擦材料。实验研究包括确定激光烧蚀羽流中能量、激发和电离度之间的关系以及与衬底的相互作用。 将开发一个理论模型的动态的瞬态激光诱导的基板上的热分布预测可能的特征尺寸的实验结果的基础上。 该项目为研究生和本科生提供了令人兴奋的机会,以获得激光物理,材料科学和热建模方面的经验。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
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Pritish Mukherjee其他文献
On-the-surface photoconductive response of pelletized thin In<sub>2</sub>S<sub>3</sub> nanosheets
- DOI:
10.1016/j.materresbull.2014.03.039 - 发表时间:
2014-07-01 - 期刊:
- 影响因子:
- 作者:
Anuja Datta;Devajyoti Mukherjee;Sarath Witanachchi;Pritish Mukherjee - 通讯作者:
Pritish Mukherjee
Laser-assisted spray pyrolysis process for the growth of TiO2 and Fe2O3 nanoparticle coatings
- DOI:
10.1557/jmr.2007.0089 - 发表时间:
2011-03-03 - 期刊:
- 影响因子:2.900
- 作者:
Sarath Witanachchi;Gayan Dedigamuwa;Pritish Mukherjee - 通讯作者:
Pritish Mukherjee
Pritish Mukherjee的其他文献
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{{ truncateString('Pritish Mukherjee', 18)}}的其他基金
Pulsed Thermal Excitation of Self-Assembled Nanotemplates for Manufacturing Dimensionally Controlled Nanostructured Films
用于制造尺寸控制纳米结构薄膜的自组装纳米模板的脉冲热激发
- 批准号:
0217939 - 财政年份:2002
- 资助金额:
$ 33.5万 - 项目类别:
Standard Grant
Pulsed Laser Ablation for Manufacturing: A Novel Dual-LaserFilm Growth Process
用于制造的脉冲激光烧蚀:一种新颖的双激光薄膜生长工艺
- 批准号:
9622114 - 财政年份:1996
- 资助金额:
$ 33.5万 - 项目类别:
Continuing Grant
Research Initiation: Plasma-Assisted Pulsed Laser Deposition of High Temperature Superconducting Thin Films; Novel Optical Plume Diagnostics
研究启动:等离子体辅助脉冲激光沉积高温超导薄膜;
- 批准号:
9210326 - 财政年份:1992
- 资助金额:
$ 33.5万 - 项目类别:
Standard Grant
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