Engineering Research Equipment Grant for Residual Gas Analyzers for Novel Semiconductor Film Growth

Sampath科罗拉多州立大学机械工程系将购买一台残余气体分析仪（RGA）和安装在我们现有真空处理设备上所需的夹具。这种加工设备采用了我们实验室开发的独特技术。该技术允许半导体和光学薄膜加工的基板直接从空气中运输到真空环境中，在真空环境中，薄膜生长可以发生，然后返回空气（AVA），基板的运输在一秒钟内发生。这种新颖的能力可以非常精确地控制薄膜的生长。独特的加工和生长条件与AVA技术是可能的。此外，样品处理的工作量和实验变异性大大降低。＊＊＊

9622282 Sampath The Department of Mechanical Engineering at Colorado State University will purchase a residual gas analyzer (RGA) and the fixturing necessary for installation on our existing vacuum processing equipment. This processing equipment incorporates a unique technology, developed in our laboratory. This technology allows substrates for semiconductor and optical film processing to be transported directly from air into a vacuum environment where film growth can occur then back to air (AVA) with the transportation of substrates taking place in under a second. This novel capability allows very precise control over film growth. Unique processing and growth conditions are possible with the AVA technology. Furthermore, sample processing effort and experimental variability have been greatly decreased.. ***