CAREER: Native Oxides on the III-V Nitrides and Chemical Cleaning of the Semiconductor Surfaces

小行星9624995 这个CAREER研究项目致力于III-V族氮化物表面原生氧化物的形成和化学蚀刻。 将研究半导体表面上有意和无意形成的氧化物的化学和结构性质，并开发用于进一步器件处理的半导体表面制备的化学处理步骤。 补充技术，包括椭圆偏振光谱，俄歇电子能谱，X射线光电子能谱，和传统的和高分辨率的透射电子显微镜将被采用。目前尚不清楚的氧化物的性质将强烈影响哪种化学蚀刻剂最能有效地去除它。考虑到许多工艺步骤，如形成欧姆接触和肖特基势垒，当在化学制备和进一步处理之间允许短暂暴露于空气时，最方便地实现。 化学表面制备过程的有效性的比较将通过非反应性欧姆接触和/或肖特基势垒GaN的制造和表征来完成。 沿着基础研究活动，本项目将半导体表面制备材料纳入电子和光子材料的本科实验室课程。其他教育措施包括更新金属科学与工程的高级实验室课程，在本科课程中增加计算机建模和可视化的使用，以及增加本科生参与研究。拟议的基础研究预计将有助于先进的微电子器件和电路的技术相关的基础材料科学知识。 从这个研究项目中获得的知识和理解，预计将有助于在一般的方式，以提高性能的先进设备和电路用于计算，信息处理和电信提供了一个基本的理解和基础，设计和生产改进的材料和工艺。 *** _

9624995 Mohney This CAREER research project addresses the formation and the chemical etching of native oxides on III-V nitride surfaces. The chemical and structural nature of intentionally and unintentionally formed oxides on the semiconductor surfaces will be studied, and chemical processing steps for the preparation of semiconductor surfaces for further devic e processing will be developed. Complementary techniques including spectroscopic ellipsometry, Auger electron spectroscopy, x-ray photoelectron spectroscopy, and conventional and high resolution transmission electron microscopy will be employed. The nature of the oxide, which is currently unknown, will strongly influence which chemical etchants w ill be most effective for removing it. Appropriate chemical treatments for removing the oxide and producing surfaces with the least residual oxygen and carbon contamination will be developed, given that many processing steps, such as the formation of ohmic contacts and Schottky barriers, are most conveniently accomplished when a brief exposure to air is allowed between chemical preparation and further processing. Comparison of the effectiveness of the chemical surface preparation procedures will be accomplished through the fabrication and characterization of non-reactive ohmic contacts and/or Schottky barriers to GaN. %%% Along with the basic research activity, this project incorporates material on surface preparation of semiconductors into an undergraduate laboratory course on electronic and photonic materials. Other educational initiatives to be undertaken include updating a senior-level laboratory course on metals science and engineering, increasing the use of c omputer modeling and visualization in the undergraduate curriculum, and increasing participation of undergraduates in research. The proposed basic investigations are expected to contribute fundamental materials science knowledge of technological relevance to advanced microelectronic devices and circuits. The knowledge and understanding gained fro m this research project is expected to contribute in a general way to improving the performance of advanced devices and circuits used in computing, information processing, and telecommunications by providing a fundamental understanding and a basis for designing and producing improved materials and processes. *** _