Continuous Air to Vacuum to Air (AVA) High Throughput Vacuum Deposition of Thin Films

本研究旨在研究物理气相沉积（PVD）源，以增加对气相源的理解和对空气-真空-空气（AVA）高通量真空沉积薄膜工艺的过程监控。研究重点包括蒸汽源通量均匀性和均匀源电荷损耗的建模，以获得更多的理解。还将研究蒸汽源控制策略，以了解过程控制的原位传感器要求。这些定量模型将通过沉积和研究用于薄膜器件和光伏的半导体薄膜得到实验验证。本研究对PVD蒸汽源的理解在包括平板显示器和光伏产业在内的大量薄膜行业中具有潜在的应用前景。此外，提出的提高薄膜均匀性和均匀电荷耗尽以及原位温度测量的研究将对许多真空沉积行业产生直接的好处。对于未来更大的晶圆尺寸来说尤其如此。

DMI-9713699 Sampath This research is to investigate the physical vapor deposition (PVD) source and to increase the understanding of the vapor source and process monitoring for the Air to Vacuum to Air (AVA) high throughput vacuum deposition of thin films process. The research focus involves modeling both the vapor source flux uniformity and on uniform source charge depletion to gain an increased understanding. The vapor source control strategy will also be studied to understand in-situ sensor requirements for process control. These quantitative models will be experimentally verified through the deposition and study of semiconductor thin films for thin film devices and photovoltaics. This research in understanding of the PVD vapor source has potential applications in a large number of thin film industries, including flat panel display and photovoltaic industries. In addition, the proposed research on improved film uniformity and uniform charge depletion and in-situ temperature measurement would have direct benefits to many vacuum deposition industries. This is especially true for bigger wafer size in the future.