SBIR Phase II: A Trace Contaminant Sensor for Semiconductor Process Gases

这个小型企业创新研究(SBIR)第二阶段项目将测试一种用于实时检测微电子制造中重要的痕量杂质的新型传感器。气体原料质量是任何过程控制策略的重要衡量标准，因为十亿分之一(Ppb)级别的污染可能会限制产品产量。该项目的技术称为波长调制光声光谱学，有可能以比目前技术低得多的成本实现这些检测水平。该技术与腐蚀性气体和非腐蚀性气体兼容。第二阶段将建造一个原型微量水分传感器并进行现场测试，该传感器有望在氯化氢和氨等腐蚀性气体中达到10 ppb的检测极限。潜在的商业应用有望在线去除微电子制造中重要的痕量杂质。

This Small Business Innovation Research (SBIR) Phase II project will test a novel sensor for real-time detection of trace impurities important in micoelectronics manufacturing. Gas feedstock quality is an important measurement for any process control strategy because contamination at the part-per-billion (ppb) level may limit product yield. This project's technique, called wavelength modulated photo-acoustic spectroscopy, has the potential to achieve these detection levels at a significantly lower cost than is possible with current technology. This technology is compatible with both corrosive and non-corrosive gases. The Phase II will construct and field test a prototype trace moisture sensor that is expected to achieve 10-ppb detection limits in corrosive gases such as hydrogen chloride and ammonia.Potential commercial applications are expected in on-line removal of trace impurities important in micoelectronics manufacturing.