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CAREER: Geometry and Morphology Effects in Colloidal Adhesion

CAREER: Geometry and Morphology Effects in Colloidal Adhesion
职业:胶体粘附中的几何和形态效应
批准号:
9984620
负责人:
Stephen Beaudoin
金额:
$21.0万
依托单位:
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
2000
资助国家:
美国
项目状态:
已结题
起止时间:
2000-05-01 至 2004-05-31

项目摘要

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中文摘要
翻译
该项目将开发一种描述复杂几何和形态对微米级胶体与基材粘附性的影响的第一原理方法。这在美国半导体制造业中非常重要。描述粒子粘着的传统方法依赖于Derjaguin-Landau-Verwey-Overbeek(DLVO)理论或将粘着功与用于胶体变形的Derjaguin-Muller-Topov(DMT)、Johnson-Kendall-Roberts(JKR)或Mugis-Dugdale(MD)模型相结合的方法。这些方法只适用于理想体系。该方法将传统的范德华(VDW)力公式修改为描述水溶液中的粘附性。它将考虑衬底和胶体的复杂几何和形态,并将包括胶体和衬底的变形和粗糙度。对半导体社区感兴趣的几何和形态复杂的胶体-底物系统的描述将包括在内。接触附着力的测量将使用原子力显微镜(AFM)进行。胶体既是良好的模型材料,也是集成电路工艺中常见的污染物(SiO_2、Al_2O_3)。基板是集成电路加工的重要基板,在半导体工业中,该方法可直接应用于刻蚀后加工和化学机械抛光后的晶片清洗方案中。在生物医药行业,它可以用来改进植入物的灭菌过程。
英文摘要
This project will develop a first principle method for describing the effects of complex geometry and morphology on the adhesion of micron-scale colloids to substrates. This is of importance in the U.S. semiconductor manufacturing industry. Traditional approaches to describing particle adhesion rely on Derjaguin-Landau-Verwey-Overbeek (DLVO) theory or on approaches using the work of adhesion in conjunction with the Derjaguin-Muller-Toporov (DMT), Johnson-Kendall-Roberts (JKR), or Maugis-Dugdale (MD) models for colloid deformation. These approaches are only applicable for idealized systems.The proposed approach will modify traditional van der Waals (vdW) force expressions to describe the adhesion in aqueous solution. It will account for complex geometry and morphology of the substrates and colloids and also will include the deformation and roughness of the colloids and substrates. Descriptions of geometrically and morphologically-complex colloid-substrate systems of interest to the semiconductor community will be included. Measurement of the contact adhesion force will be performed with an atomic force microscope (AFM). The colloids are either good model materials or common contaminants in integrated circuit processing (SiO 2 , and Al 2 O 3 ). The substrates are important substrates for integrated circuit processing.In the semiconductor industry, the proposed approach could find immediate application in wafer cleaning protocols during post-etch processing and post-chemical-mechanical-polishing processing. In the biomedical industry, it could be used to improve implant sterilization processes.
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GOALI - Particle Adhesion in Semiconductor Wafer Cleaning
  • 批准号:
    0829086
  • 项目类别:
    Standard Grant
  • 资助金额:
    $30.0万
  • 财政年份:
    2008
  • 负责人:
    Stephen Beaudoin
  • 依托单位:
REU Site: Design, Application, Analysis and Control of Interfaces (DAACI)
  • 批准号:
    0552933
  • 项目类别:
    Standard Grant
  • 资助金额:
    $0.0万
  • 财政年份:
    2006
  • 负责人:
    Stephen Beaudoin
  • 依托单位:
SGER: Hydrophobic Forces in Particle Adhesion
  • 批准号:
    0414019
  • 项目类别:
    Standard Grant
  • 资助金额:
    $4.0万
  • 财政年份:
    2004
  • 负责人:
    Stephen Beaudoin
  • 依托单位:
CAREER: Geometry and Morphology Effects in Colloidal Adhesion
  • 批准号:
    0401632
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $0.0万
  • 财政年份:
    2003
  • 负责人:
    Stephen Beaudoin
  • 依托单位:
国内基金
海外基金
2019年度国际理论物理中心-ICTP School on Geometry and Gravity (smr 3311)
  • 批准号:
    11981240404
  • 项目类别:
    国际(地区)合作与交流项目
  • 资助金额:
    1.5万元
  • 批准年份:
    2019
  • 负责人:
    季丹丹
  • 依托单位:
新型IIIB、IVB 族元素手性CGC金属有机化合物(Constrained-Geometry Complexes)的合成及反应性研究
  • 批准号:
    20602003
  • 项目类别:
    青年科学基金项目
  • 资助金额:
    26.0万元
  • 批准年份:
    2006
  • 负责人:
    自国甫
  • 依托单位: