Acquisition of a Workhorse Electron Beam Lithography System for Microstructured Materials and Devices Research
Acquisition of a Workhorse Electron Beam Lithography System for Microstructured Materials and Devices Research
批准号:
0079628
负责人:
Xinsheng Ling
金额:
$15.12万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2000
资助国家:
美国
项目状态:
已结题
起止时间:
2000-08-01 至 2002-07-31
中文摘要
该项目涉及采购电子束光刻(EBL)系统,该系统采用最新的纳米定位技术,用于布朗大学微结构材料和器件的研究和教育。所获得的系统由最先进的扫描电子显微镜和伯利尺蠖纳米定位系统作为样品台组成。该系统提供了许多功能,例如在25毫米视场中产生亚微米特征,目前只有数百万美元的EBL机器以很小的成本提供这些功能。布朗大学的一大群实验学家在微结构材料和器件的前沿进行实验研究。该仪器将大大提高凝聚态物理、液晶显示技术、小型半导体器件、新型磁电子学、半导体激光器和实验宇宙学等现有研究项目的研究效率,开辟新的令人兴奋的研究方向,将对材料研究和教育产生重大影响,并将使布朗大学的大量研究生和本科生受益。该项目涉及采购电子束光刻(EBL)系统,该系统采用最新的伯利尺蠖纳米定位技术,用于布朗大学的微纳米结构材料和器件的研究和教育。EBL是最先进的纳米技术,它已经彻底改变了许多科学和技术领域。布朗大学的一大群实验学家在微结构材料和器件的前沿进行实验研究。布朗大学的研究生和本科生将使用EBL系统制造人工设计的图案,用于胶体结晶的基础研究、超快晶体管和新型磁电子器件的应用研究、探索新型液晶材料和开发用于宇宙学实验的传感器。获得的EBL系统提供了许多功能,例如在大视场内产生亚微米特征,目前只有数百万美元的EBL机器以很小的成本提供这些功能。这种低成本的EBL系统将被安置在布朗大学所有物理学家和工程师都在工作的巴鲁斯-霍利大楼里。该仪器将大大提高现有研究项目的研究效率,并开辟新的令人兴奋的研究方向,将对布朗大学的材料研究和教育产生重大影响,并将使大量研究生和本科生受益。
英文摘要
0079628Ling This projects involves the acquisition of a workhorse Electron Beam Lithography (EBL) system using the latest nanopositioning technology for microstructure materials and devices research and education at Brown University. The acquired system consists of a state-of-the-art scanning electron microscope and a Burleigh Inchworm Nanopositioning System as the sample stage. The system offers many of the capabilities, such as the generation of submicron features in a field of view of 25 mm, currently only offered by the multimillion-dollar EBL machines at a small fraction of the cost. A large group of experimentalists at Brown University conduct experimental research at the frontiers of microstructured materials and devices. This workhorse EBL instrument will greatly enhance the research productivity for the existing research programs in condensed matter physics, liquid crystal display technology, small semiconductor devices, novel magnetoelectronics, semiconductor lasers, and experimental cosmology, and open up new exciting research directions, will have a major impact on the materials research and education and will benefit a large number of graduate and undergraduate students at Brown University. This project involves the acquisition of a workhorse Electron Beam Lithography (EBL) system using the latest Burleigh Inchworm nanopositioning technology for micro and nano structured materials and devices research and education at Brown University. The EBL is the state-of-the-art nanotechnology which has revolutionized many areas of science and technology. A large group of experimentalists at Brown University conduct experimental research at the frontiers of microstructured materials and devices. Graduate and undergraduate students at Brown will use the EBL system to fabricate artificially designed patterns for fundamental studies of colloidal crystallization, for applied research in ultrafast transistors and novel magnetoelectronic devices, and for exploring novel liquid crystal materials and for developing sensors for cosmology experiment. The acquired EBL system offers many of the capabilities, such as generating submicron features in a large field of view, currently only offered by the multimillion-dollar EBL machines at a small fraction of the cost. This low-cost EBL system will be housed in the Barus-Holley Building where all physicists and engineers at Brown are working. This instrument will greatly enhance the research productivity for the existing research programs, and open up new exciting research directions, will have a major impact on the materials research and education at Brown and will benefit a large number of graduate and undergraduate students.
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