SBIR Phase II: Randomly Textured Nanoscale Surfaces for Silicon Solar Cells

这个小企业创新研究（SBIR）二期项目将把随机反应离子蚀刻（RIE）纹理技术整合到低成本、多晶（mc）硅（Si）太阳能电池中。在第一阶段开发的RIE纹理技术以其低反射（1%），大面积（200平方厘米）的应用以及控制蚀刻轮廓的能力而闻名。这种织构控制已被用来增加近红外吸收的Si通过增强斜光耦合到衬底。rie织构技术在低成本表面增强拉曼散射衬底和场发射器件等领域具有潜在的应用前景。第二阶段将关注适合于rie纹理表面的共形发射器形成技术。这些方法将导致太阳能电池在集群环境中制造，具有类似的室用于纹理，发射极形成和表面钝化的氮化膜。潜在的工业应用有望在高效，rie纹理，mc-Si太阳能电池中使用适合其各自制造环境的工艺。

This Small Business Innovation Research (SBIR) Phase II project will integrate random, reactive ion etching (RIE) texturing techniques into low-cost, multi-crystalline (mc) silicon (Si) solar cells. RIE texturing techniques, developed in Phase I, are distinguished by their low-reflection (1 percent), large area (200 square centimeters) application, and the ability to control etched profiles. This texture control has been employed to increase near infrared absorption in Si by enhanced oblique optical coupling into the substrate. RIE-texturing techniques have potential application in several fields including low-cost substrates for surface enhanced Raman scattering and field emission devices. Phase II will be concerned with conformal emitter formation techniques uniquely suited to RIE-textured surfaces. These methods will lead to solar cell manufacturing in a cluster environment with similar chambers for texturing, emitter formation, and nitride films for surface passivation.Potential industrial applications are expected in high-efficiency, RIE-textured, mc-Si solar cells using processes suitable for their respective manufacturing environments.